Chisso Corporation

Katsuhiko Kobayashi

Hiroyuki Takeuchi

Shuichi Matsui

Kazutoshi Miyazawa

Etsuo Nakagawa

Fusayuki Takeshita

Yoshitaka Tomi

Koichi Shibata

Yasusuke Hisatsune

Tugumiti Andou

Hideo Sato

Tomoyuki Kondo

Hiroshi Kawabata

A method of producing a difluorobenzyl ether derivative (6)

Benzene derivative and its production method

A compound expressed by the general formula (1):

Polyhaloalkyl ether derivatives as well as liquid crystal compositions and liquid crystal display elements containing them

A compound expressed by the general formula (1): wherein

Polyhaloalkyl ether derivatives as well as liquid crystal compositions

There is provided a liquid crystal composition in particular with a low threshold voltage and a wide range of nematic phase temperature (with high TNI point and low TC), while satisfying various properties required for liquid crystal compositions for active matrix type liquid crystal display elements. The composition contains, for example, compounds represented by general formulas (1-1) and (2-1): ##STR1## where each R.sub.1 independently represents an alkyl group having 1 to 10 carbon atoms; X.sub.1 represents H or F; and each X.sub.2 independently represents F, OCF.sub.3, CF.sub.3, or OCF.sub.2 H.

Liquid crystal composition and liquid crystal display element

A photocurable resin composition is described, which comprises a specific type of photosensitive polymer obtained by copolymerization of a monomer of the following general formula [I] ##STR1## in which R.sup.1 represents H, CH.sub.3 or C.sub.2 H.sub.5, X represents --O-- or --NH--, Y represents a linear or branched hydrocarbon group having from 1 to 4 carbon atoms, and .PHI. represents ##STR2## Z.sup..crclbar., in which Z.sup..crclbar. represents an anion, and R.sup.2, R.sup.3 and R.sup.4 are independently an alkyl group having from 1 to 4 carbon atoms, and a monomer of the following general formula [II] ##STR3## in which R.sup.5 represents H, CH.sub.3 or C.sub.2 H.sub.5, and n and x are independently an integer of from 1 to 4. The photosensitive polymer is photocrosslinked with a diazide compound. The resin composition is particularly suitably for use in formation of a color filter because of good dyeability and good adhesion to a substrate.

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Chiba-ken, Japan

Katsuhiko Kobayashi