Suss Microtec Lithography Gmbh

Suss Microoptics Sa

Hoffmann Engineering Services Gmbh

Katrin Schindler

Sven Hansen

Hans Schlenker

Wilfried Noell

Isabel Agireen

Sophiane Tournois

Thomas Huelsmann

Susanne Westenhoefer

Thomas Mültner

A method for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit is disclosed. The method comprises the following steps: At least a predefined portion of the optical projection unit is illuminated so that an image is generated by at least two channels of the predefined portion of the multi-channel optical projection unit. At least one characteristic quantity is determined based on the analysis of the image, wherein a value of the characteristic quantity is associated with a characteristic feature of the projection unit, a defect of the projection unit and/or a defect class of the projection unit. The quality of the projection unit is assessed based on the at least one characteristic quantity. Moreover, a test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit and a computer program are disclosed.

Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit

A chuck for aligning a first planar substrate in parallel to a second planar substrate includes a top plate having a top surface for arrangement of the first planar substrate. A bottom plate is at least one distance measuring sensor configured to measure a distance between the top surface of the top plate and a surface of the second planar substrate, and at least three linear actuators in contact with the top plate and the bottom plate. The method for setting a gap between the first and second planar substrate includes measuring the thickness of the first planar substrate and measuring between a surface of the second planar substrate and the top surface of the top plate. The tilt adjusts between a top surface of the first planar substrate or the chuck and the surface of the second planar substrate by using at least three linear actuators of the chuck.

Chuck, in particular for use in a mask aligner

Growing community of inventors

Garching, Germany

Katrin Schindler