Rohm & Haas Electronic Materials LLC

Dow Global Technolgoies LLC

Rohm and Haas Electronic Materials Korea Ltd.

Rohm and Haas Company

Shipley Company LLC

Kathleen M O'Connell

Peter Trefonas, Iii

Deyan Wang

Garo Khanarian

Christopher D Gilmore

Jibin Sun

Jerome Claracq

Lujia Bu

Jaebum Joo

Peng-Wei Chuang

Young Seok Kim

Yerang Kang

Lijia Bu

Phillip Dene Hustad

Jong Keun Park

Shintaro Yamada

Charles R Szmanda

Martin William Bayes

Jieqian Zhang

Weijun Zhou

Shih-Wei Chang

Stefan J Caporale

Dana A Gronbeck

Jake Joo

Sylvie Vervoort

Lanfang Li

Ping Ding

Kathleen B Spear-Alfonso

Moo-Young Lee

Mubasher Bashir

Michael N Gaudet

William Andrew Burke

A coated glass substrate. The coated glass substrate comprises a glass sheet having a thickness from 0.1 to 0.7 mm and coated on a first side with a first optical layer having a positive photo-elastic constant and coated on a second side with a second optical layer having a negative photo-elastic constant.

Photo-elastic compensation of thin glass sheets

Certain polyarylene oligomers having improved solubility are useful in forming dielectric material layers in electronics applications.

Polyarylene materials

The invention provides a composition comprising at least the following A and B:

Metal hardmask compositions

A method of manufacturing a display device is provided which uses a sacrificial layer interposed between a carrier and a display device substrate.

Display device manufacture using a sacrificial layer interposed between a carrier and a display device substrate

A method of forming a pattern by directed self-assembly, comprising: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) applying a crosslinkable underlayer composition over the one or more layers to be patterned to form a crosslinkable underlayer, wherein the crosslinkable underlayer composition comprises a crosslinkable polymer comprising a first unit formed from a monomer of the following general formula (I-A) or (I-B): wherein: P is a polymerizable functional group; L is a single bond or an m+1-valent linking group; Xis a monovalent electron donating group; Xis a divalent electron donating group; Arand Arare trivalent and divalent aryl groups, respectively, and carbon atoms of the cyclobutene ring are bonded to adjacent carbon atoms on the same aromatic ring of Aror Ar; m and n are each an integer of 1 or more; and each Ris independently a monovalent group; (c) heating the crosslinkable underlayer to form a crosslinked underlayer; (d) forming a self-assembling layer comprising a block copolymer over the crosslinked underlayer; and (e) annealing the self-assembling layer. The methods and compositions find particular applicability in the manufacture of semiconductor devices or data storage devices for the formation of high resolution patterns.

Directed self-assembly pattern formation methods and compositions

Method of manufacturing patterned transparent conductor is provided, comprising: providing a silver ink core component containing silver nanoparticles dispersed in a silver carrier; providing a shell component containing a film forming polymer dispersed in a shell carrier; providing a substrate; coelectrospinning the silver ink core component and the shell component to form a core shell fiber, wherein the silver nanoparticles are in the core; depositing the core shell fiber on the substrate; selectively treating a portion of the deposited core shell fiber to provide a patterned transparent conductor, wherein the patterned transparent conductor has a treated region and a non-treated region; wherein the treated region comprises a plurality of electrically interconnected silver miniwires and wherein the treated region is an electrically conductive region; and, wherein the non-treated region is an electrically insulative region.

Method of manufacturing a patterned transparent conductor

Compositions suitable for forming oxymetal hardmask layers are provided. Methods of forming oxymetal hardmask layers using such compositions are also provided, where the surface of the oxymetal hardmask layer formed has a water contact angle substantially matched to that of subsequently applied organic coatings.

Hardmask surface treatment

The invention provides a process for removing a film from a substrate, said process comprising applying a composition to the film, and The invention also provides a composition comprising at least the following:

Methods and compositions for removal of metal hardmasks

Method of manufacturing patterned conductor is provided, comprising: providing a conductivized substrate, wherein the conductivized substrate comprises a substrate and an electrically conductive layer; providing an electrically conductive layer etchant; providing a spinning material; providing a masking fiber solvent; forming a plurality of masking fibers and depositing the plurality of masking fibers onto the electrically conductive layer; exposing the electrically conductive layer to the electrically conductive layer etchant, wherein the electrically conductive layer that is uncovered by the plurality of masking fibers is removed from the substrate, leaving an interconnected conductive network on the substrate covered by the plurality of masking fibers; and, exposing the plurality of masking fibers to the masking fiber solvent, wherein the plurality of masking fibers are removed to uncover the interconnected conductive network on the substrate.

A method of manufacturing a silver miniwire film is provided, wherein the film exhibits a reduced sheet resistance.

Method of manufacturing silver miniwire films

Organoaluminum coating compositions are used to deposit films on various substrates, which films are subsequently cured to form oxide films useful in a variety of manufacturing applications, particularly where a gas barrier may be used.

Organoaluminum materials for forming aluminum oxide layer from coating composition that contains organic solvent

Provided herein is a process of fractionating ferroelectric, preferably vinylidene fluoride polymers using a solvent having at least one polarizable functional group, and a precipitant. The composition of the fractionated ferroelectric polymers is selected so as to adjust the properties of a ferroelectric film made from the polymers. Films formed using the fractionated vinylidene fluoride polymers have improved properties, particularly with respect to roughness and crystal domain size, and suitability for use in data processing devices.

Process of fractionating polymers

The invention is for a process of removing dissolved heavy metal cation contaminants from an organic solution. The process of the invention involves providing a mixture of a chelating ion exchange resin modified by removal of sodium ions therefrom and an anion exchange resin and contacting said organic solution with said exchange resins for a time sufficient to remove ionic metal impurities and acids. The invention is useful for removal of ionic contaminants from organic solutions requiring high purity.

Growing community of inventors

Cumberland, RI, United States of America

Kathleen M O'Connell