Sokudo Co., Ltd.

Kasuhito Shigemori

Koji Kaneyama

Shuichi Yasuda

Hiroshi Kobayashi

Tadashi Miyagi

Masashi Kanaoka

Akihiro Hisai

Tsuyoshi Okumura

Toru Asano

A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

Substrate processing apparatus and substrate processing method

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Kyoto, Japan

Kasuhito Shigemori