Merck Patent Gmbh

Karsten Koppe

Nikolai (Mykola) Ignatyev

Walter Frank

Michael Schulte

Frank Meyer

Vural Bilir

Naofumi Yoshida

Urs Welz-Biermann

Gregor Larbig

Nikolai Mykola Ignatyev

Peter Barthen

Joerg Pahnke

Pawel Miskiewicz

Christoph Alexander Jablonka

Hermann Josef Frohn

Nikolai (mykola) Ignatyev

The present invention relates to novel positive tone photoresist formulations comprising using crosslinkable siloxane polymers. The siloxane polymers used in the positive tone photoresist formulations are crosslinkable and comprise a first repeating unit, which contains at least one maleimide group, and a second repeating unit, which does not contain a maleimide group. The present invention further provides a manufacturing method for a microelectronic structure using a positive tone photoresist formulation according to the present invention and to an electronic device comprising a microelectronic structure, which is obtained or obtainable by said manufacturing method.

Positive tone photoresist formulation using crosslinkable siloxane compounds

The present invention relates to a novel class of polymers which can be used as dielectric material for the preparation of passivation layers in electronic devices. The polymers are prepared from polymerizable compounds having mesogenic groups and they provide excellent film forming capability and excellent mechanical properties and have a low dielectric constant and a low coefficient of thermal expansion (CTE). There is further provided a method for forming said polymers and an electronic device containing said polymers as dielectric material. Beyond that, the present invention relates to a manufacturing method for preparing a packaged microelectronic structure and to a microelectronic device comprising said packaged microelectronic structure formed by said manufacturing method.

Dielectric materials

The present invention relates to a polymerizable mixture which can be used to form a dielectric material for the preparation of passivation layers in electronic devices. The polymerizable mixture comprises a first monomer and a second monomer which may react to form a copolymer providing excellent film forming capability, excellent thermal properties and excellent mechanical properties. There is further provided a method for forming said copolymers and an electronic device containing said copolymers as dielectric material. Beyond that, the present invention relates to a manufacturing method for preparing a packaged microelectronic structure and to a microelectronic device comprising said packaged microelectronic structure formed by said manufacturing method.

Dielectric copolymer materials

The invention relates to alkenyl(perfluoroalkyl)phosphinic acids, to the preparation and intermediates thereof, to the use thereof as monomers for the preparation of oligomers and/or polymers, to the corresponding oligomers/polymers, to the corresponding support materials comprising the oligomers/polymers, and to the use thereof as ion exchangers, as catalysts or extraction medium and corresponding salts thereof.

Alkenyl (perfluoroalkyl) phosphinic acids

Alkenyl(perfluoroalkyl)phosphinic acids

The invention relates to a method for producing tris(perfluoroalkyl)phosphine oxides and bis(perfluoroalkyl)phosphinic acids by reacting tris(perfluoroalkyl)difluorophosphorane or bis(perfluoroalkyl)trifluorophosphorane with non-metal oxides, metalloid oxides or organic compounds with basic oxygen residues.

Process for the preparation of tris(perfluoroalkyl)phosphine oxides and bis(perfluoroalkyl)phosphinic acids

The invention relates to a process for the preparation of alkyl phosphinates, alkenyl phosphinates, alkynyl phosphinates or phenyl phosphinates by reaction of a corresponding phosphine oxide with an alcohol or phenol in the presence of alkali-metal fluoride or tetraalkylammonium fluoride.

Process for the preparation of phosphinic acid esters

The present invention relates to a process for the cleavage of dialkoxyalkanes to give corresponding aldehydes or ketones, where the cleavage is carried out in the presence of at least one ionic liquid of the general formula KA.

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Marl-Polsum, Germany

Karsten Koppe