Other

Carl-zeiss-stiftung

Karlfried Osterried

Vadim Yevgenyevich Banine

Wolfgang Singer

Johannes Wangler

Franz Sorg

Markus Weiss

Frank Melzer

Bernd Kleemann

Michael Trunz

Andreas Heisler

Frank Marianek

Markus Kasparek

Michael Ebert

There is provided an illumination system for wavelengths of &lE;100 nm, having an object plane and a field plane. The illumination system includes a grating element having a plurality of gratings, and a diaphragm. The diaphragm is arranged after the grating element in a beam path from the object plane to the field plane.

Illumination system with a plurality of individual gratings

A device for the low-deformation support of an optical element ( ), in particular of an end plate of a lens in a projection printing system for semiconductor elements, is provided with a mount ( ), the optical element ( ) being connected to the mount ( ) at least partly via a bonding layer which is located between the adjacent circumferential walls ( ) of mount ( ) and optical element ( ). The mount ( ) is provided with at least three bearing feet ( ) which are distributed over the circumference and on which the optical element ( ) rests. The bonding layer is located in an annular gap ( ) between the adjacent circumferential walls ( ) of mount ( ) and optical element ( ) over at least one section thereof.

Device for the low-deformation support of an optical element and method for the low-deformation support of the optical element

Growing community of inventors

Aalen, Germany

Karlfried Osterried