Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Karl-Stefan Weissenrieder

Alexandra Pazidis

Toralf Gruner

Franz Sorg

Julian Kaller

Ralf Winter

Karl-Heinz Schuster

Heiko Feldmann

Daniel Kraehmer

Ulrich Loering

Christoph Zaczek

Vladimir Kamenov

Markus Brotsack

Stephan Six

Alexander Hirnet

Bruno Thome

Michael Lill

Achim Zirkel

Roland Loercher

Guenter Scheible, Legal Representative

Harald Schink

An optical assembly includes: an optical element, which is transmissive or reflective to radiation at a used wavelength and has an optically used region; and a thermally conductive component, which is arranged outside the optically used region of the optical element. The thermally conductive component can include a material having a thermal conductivity of more than 500 W mK. Additionally or alternatively, the product of the thickness of the thermally conductive component in millimeters and the thermal conductivity of the material of the thermally conductive component is at least 1 W mm mK.

Optical assembly having a thermally conductive component

The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

Microlithographic projection exposure apparatus

A micromirror arrangement () having: at least one micromirror () having a reflective surface () formed at a mirror substrate (), and an antireflective coating () formed at the mirror substrate () outside the reflective surface (). A reflective coating () is formed within the reflective surface () and has at least two layer subsystems, wherein the first layer subsystem has layers () composed of a periodic sequence of alternate high and low refractive index layers composed of a nonmetallic material and is optimized with regard to the reflectivity in respect of a used wavelength of the micromirror arrangement, and wherein the second layer subsystem is optimized with regard to the reflectivity in respect of a measurement wavelength of the micromirror arrangement, said measurement wavelength deviating from the used wavelength.

Micromirror arrangement having a coating and method for the production thereof

In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

Projection objective for immersion lithography

Growing community of inventors

Elchingen, Germany

Karl-Stefan Weissenrieder