Basf Se Corporation

Mine Safety Appliances Company

Karl Matos

Elizabeth R Burkhardt

Joseph A Corella, Ii

Shawn M Nettles

Thomas Schaub

Daniel Loeffler

Axel Kirste

Maraike Ahlf

David Dominique Schweinfurth

Falko Abels

Boris Gaspar

Jan Spielmann

Christopher P Sutton

Kevin M Neigh

Florian Blasberg

David F Rouda

Ralph Dieter Maier

Alex J Attlesey

John Michael Davis

Kristin Schroeder

Ronald J Orosz

A dual-curable sealant composition includes a polysulfide having an &#x2014;SH group, a metal oxide catalyst, and an alkylborane amine catalyst. A cured sealant is also formed from the dual-curable sealant composition. Moreover, a dual-cured sealant is formed that includes the polymerization product of the polysulfide reacted in the presence of the metal oxide catalyst and the alkylborane amine catalyst. Further, a dual-curable sealant system includes a first component including the polysulfide and the alkylborane amine catalyst and a second component including the metal oxide catalyst. An article is formed that includes a substrate and the cured sealant disposed on the substrate. Even further, a method of forming the dual-curable sealant composition includes the steps of providing the polysulfide, the alkylborane amine catalyst, and the metal oxide catalyst, and combining the polysulfide, the alkylborane amine catalyst, and the metal oxide catalyst to form the dual-curable composition.

Dual-curable sealant composition

The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.

Process for the generation of metallic films

The present invention provides a process for preparing triorgano borates with low alcohol content.

Process for preparing triorgano borates with low alcohol content

In a process for the accelerated reduction of organic substrates, selected from the group consisting of esters, amides, nitriles, acids, ketones, imines or mixtures thereof, they are reacted with an amine borane, sulfide borane or ether borane complex as a borane source in the presence of organic accelerator compounds containing either Lewis acidic or Lewis basic sites in their structure, of which the Lewis acidic site can coordinate with the carbonyl or nitrile or imine group of the substrate or the Lewis basic site can coordinate with the borane.

Accelerated amide and ester reductions with amine boranes and additives

A method of increasing enantioselectivity in a reduction reaction of a prochiral substrate with a borane reagent including a borohydride species (for example, a borohydride stabilized borane-tetrahydrofuran complex) catalyzed by a chiral catalyst includes the step of maintaining the concentration of borohydride species in the borane reagent below approximately 0.005 M during the reduction of the prochiral substrate. A method of increasing enantioselectivity in a reduction reaction of a prochiral substrate with a borane reagent including a borohydride species that is catalyzed by a chiral catalyst includes the step of reducing the detrimental effect the borohydride species has on enantioselectivity by adding a Lewis acid. For example, the prochiral substrate can be a ketone and the chiral catalyst can be a chiral oxazaborolidine.

Increasing enantioselectivity in reductions with borane reagents

Increasing enatioselectivity in reductions with borane reagents

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Sewickley, PA, United States of America

Karl Matos