Wacker-chemie Gmbh

Wacker Chemie Ag

Karl Hesse

Franz Schreieder

Harald Hertlein

Eckhard Hanelt

Walter Haeckl

Dirk Flottmann

Matth&auml;us Schantz

Reinhard Wolf

Axel Frauenknecht

Jürgen Pfeiffer

Robert Maurer

Wilhelm Hoebold

An anode active material for lithium ion batteries includes one or more unaggregated silicon particles having a mass-based chlorine content of from 5 to 200 ppm and a volume-weighted particle size distribution having diameter percentiles dof from 0.5 μm to 10.0 μm.

Silicon particles having a specific chlorine content, as active anode material for lithium ion batteries

The invention provides a process for producing polycrystalline silicon, by introducing reaction gases containing a silicon-containing component and hydrogen into reactors to deposit silicon, wherein a purified condensate from a first deposition process in a first reactor is supplied to a second reactor, and is used in a second deposition process in that second reactor.

Process for producing polycrystalline silicon

Polycrystalline silicon is prepared by thermally decomposing a reaction gas comprising hydrogen and a silicon-containing gas in a reaction chamber containing heated silicon, depositing additional silicon thereon, and forming an offgas; and separating the offgas into a first fraction comprising trichlorosilane and lower boiling chlorosilanes, and a second offgas fraction comprising components having a higher boiling point than trichlorosilane; recycling the first offgas fraction to the reaction gas of a polycrystalline silicon deposition; and separating the second offgas fraction into tetrachlorosilane and a high boiler fraction of high boilers, optionally also containing some tetrachlorosilane, and supplying the high boiler fraction to the reaction gas of a silicon deposition and heating the reaction gas to a temperature which ensures that the high boiler fraction is present in gaseous form on entry into the reaction chamber of the deposition reactor.

Process for depositing polycrystalline silicon

A crusher for producing fine silicon fragments for semiconductor or solar applications from silicon fragments suitable for semiconductor or solar applications, comprises a plurality of crushing tools, the crushing tools having a surface made from a hard, wear-resistant material, wherein the crusher has a comminution ratio e of from 1.5 to 3.

Apparatus and method for the low-contamination, automatic crushing of silicon fragments

A device is provided for depositing semiconductor material on a heated substrate body, having a stationary current leadthrough, which is guided through the baseplate of the deposition device. This is an electrode mount with an underside, which is arranged above the current leadthrough, and an upper side, which is connected to a carbon electrode into which a substrate body can be fitted. The carbon electrode has a thermal conductivity of >145 W/m*K and a coefficient of thermal expansion which is matched to the coefficient of thermal expansion of silicon.

Deposition device for depositing semiconductor material on a heated substrate

A device for the optoelectronic classification of semiconductor materials, which has an identifying device,that forwards the morphology of the product,to be classified to an evaluating device,which evaluates the data.

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Burghausen, Germany

Karl Hesse