Carl-zeiss-stiftung

Carl-zeiss-smt Ag

Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Karl Heinz Schuster

Wilhelm Ulrich

Aurelian Dodoc

Hans-Juergen Rostalski

Joerg Mallmann

Vadim Yevgenyevich Banine

Wolfgang Singer

Johannes Wangler

Hubert Holderer

Bernhard Gellrich

Susanne Beder

Martin Antoni

Ulrich Loering

Markus Weiss

Andreas Wurmbrand

Juergen Fischer

Axel Scholz

Rainer Hoch

Albrecht Ranck

Philipp Bosselmann

Marcel Dierichs

Roel Moors

Bernd Warm

An aspheric reduction objective has a catadioptric partial objective (L), an intermediate image (IMI) and a refractive partial objective (L). The catadioptric partial objective has an assembly centered to the optical axis and this assembly includes two mutually facing concave mirrors (MM). The cutouts in the mirrors (BB) lead to an aperture obscuration which can be held to be very small by utilizing lenses close to the mirrors and having a high negative refractive power and aspheric lens surfaces (). The position of the entry and exit pupils can be corrected with aspherical lens surfaces () in the field lens groups. The number of spherical lenses in the refractive partial objective can be reduced with aspherical lens surfaces () arranged symmetrically to the diaphragm plane. Neighboring aspheric lens surfaces () form additional correction possibilities.

Catadioptric objective

A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

Microlithographic projection exposure apparatus

A microlithographic projection exposure apparatus contains an illumination system () for generating projection light () and a projection lens () with which a reticle () that is capable of being arranged in an object plane () of the projection lens can be imaged onto a light-sensitive layer () that is capable of being arranged in an image plane () of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L; L; L; L; L; L; L; L) of the projection lens on the image side is immersed in an immersion liquid (). A terminating element () that is transparent in respect of the projection light () is fastened between the final lens element on the image side and the light-sensitive layer.

There is provided an illumination system that includes (a) a light source that emits light having a wavelength &#x2266;193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

Illumination system for a wavelength of &#x2266; 193 nm, with sensors for determining an illumination

An aspheric reduction objective has a catadioptric partial objective (L ), an intermediate image (IMI) and a refractive partial objective (L ). The catadioptric partial objective has an assembly centered to the optical axis and this assembly includes two mutually facing concave mirrors (M M ). The cutouts in the mirrors (B B ) lead to an aperture obscuration which can be held to be very small by utilizing lenses close to the mirrors and having a high negative refractive power and aspheric lens surfaces ( ). The position of the entry and exit pupils can be corrected with aspherical lens surfaces ( ) in the field lens groups. The number of spherical lenses in the refractive partial objective can be reduced with aspherical lens surfaces ( ) arranged symmetrically to the diaphragm plane. Neighboring aspheric lens surfaces ( ) form additional correction possibilities.

The invention is directed to a catadioptric microlithographic reduction objective having two concave mirrors (,) facing toward each other. The concave mirrors have a symmetrical configuration and a central bore. Lenses (,to,) are mounted downstream of the mirrors (,) on the light path toward the image plane (,). Preferably, lenses (,to,) are moved at the object end forward into the intermediate space between the mirrors (,) in the region of the central bore. The light path between the concave mirrors can then preferably be free of lenses. The formation of an intermediate image (Z) downstream of the mirrors (,) affords especially good correction possibilities.

Catadioptric microlithographic reduction objective

The invention is directed to a double refracting planar plate arrangement and a .lambda./4 plate suitable for deep ultraviolet light. The .lambda./4 plate or the like is configured as a planar plate with stress-induced birefringence. The planar plate 1 is made of high quality quartz glass and is torsion-free and uniformly loaded in tension via suitable construction having several parallel tension devices (3, 7).

Double-refracting planar plate arrangement and deep ultraviolet

Growing community of inventors

Königsbronn, Germany

Karl Heinz Schuster