Wacker Chemie Ag

Karl-Heinz Rimboeck

Konrad Mautner

Natalia Sofina

Uwe Paetzold

Michael Mueller

Gerhard Traunspurger

Marek Sobota

Johannes Sundberg

Tassilo Freiherr Von Aretin

Karone Aseervatham

The present disclosure relates to a process for producing chlorosilanes in a fluidized bed reactor by reacting a hydrogen chloride-containing reaction gas with a particulate contact mass containing silicon and optionally a catalyst. The chlorosilanes have the general formula HSiCland/or HClSi. The reactor design is described by an index K1, the constitution of the contact mass without catalyst is described by an index K2, the constitution of the contact mass with catalyst is described by an index K2, and the reaction conditions are described by an index K3.

Process for preparing chlorosilanes

Silicon metal-containing agglomerates are produced by agglomerating a mixture of finely divided silicon metal-containing particles having a particle size parameter d50 of not more than 250 μm and in the dry state a silicon metal content of at least 10% by mass, at least one binder containing 90% to 98% by mass of silicon dioxide and having a specific surface area of 15 to 35 m/g, and water,

Process for producing silicon metal-containing agglomerates

Technical-grade silicon is produced by reacting a raw material mixture containing silicon dioxide and carbon in an electric furnace with a particulate mediator containing at least one of the elements C, O, Al and Si is reacted in an electric furnace, wherein the mixture is described by a dimensionless index K, K having a value of from 0 to 745 and being calculated as follows:

Method for producing technical silicon

The present disclosure relates to a process for producing chlorosilanes in a fluidized bed reactor by reaction of a hydrogen and silicon tetrachloride-containing reaction gas with a particulate contact mass containing silicon and a catalyst. The chlorosilanes have the general formula HSiCland/or HClSi. The reactor design is described by an index K1, the constitution of the contact mass is described by an index K2 and the reaction conditions are described by an index K3.

Technical silicon is produced by heating a raw material mixture comprising particulate silicon metal-containing material and a particulate mediator containing at least one of C, O, Al, Ca and Si, to at least 1490° C., forming a liquid silicon phase, and solidifying this phase, wherein the raw material mixture a characteristic number K of from 0.000 to 60, calculated as follows:

The content of boron compounds in a composition containing at least one halosilane is reduced by bringing the composition into contact with at least one phenylsilane and removing the at least one halosilane. The invention further relates to the use of phenylsilanes for removing boron compounds from halosilane-containing compositions.

Process for reducing the content of boron compounds in halosilane-containing compositions

Silicon and silica values are obtained from recycled organosilicon products such as silicones, by introducing a recycle feed containing the organosilicon products into an electric furnace while producing metallurgical grade silicon from a silica source and a carbon source.

Recycling of materials containing organosilicon compounds

Chlorosilanes of the general formula HSiCland/or HClSi, where n=1-4 and m=0-4, are produced in a fluidized bed reactor by reaction of a hydrogen chloride-containing reaction gas with a silicon contact mass granulation mixture composed of a coarse grain fraction and a fine grain fraction, wherein the average particle size of the fine grain fraction dis smaller than the average particle size of the coarse grain fraction d.

Method for producing chlorosilanes

Organochlorosilanes are produced by reacting, in a fluidized bed reactor, a chloromethane-containing reactant gas with a particulate contact mass containing silicon and a catalyst, wherein the organochlorosilanes have the general formula (CH)HSiClwhere n=1 to 3 and m=0 or 1, wherein the process is characterized by three dimensions indices K-K, which are respectively associated with the reactor, the contact mass, and the reaction conditions, and which are maintained within specified bounds.

Method for preparing organochlorosilanes

Metallurgical silicon containing impurities of carbon and/or carbon-containing compounds is classified and subsequently used selectively for chlorosilane production. The process comprises the steps of: As a result of the process, metallurgical silicon having a total carbon content of up to 2500 ppmw can be used for producing chlorosilanes.

Method of classifying metallurgical silicon

Chlorosilanes are produced in exalted yield in a fluidized bed process when the reactor hydraulic diameter, Sauter particle diameter, and superficial gas velocity are used to define a parameter space as a function of Reynolds number and Archimedes number.

Generally unusable or difficultly useable dusts of ultrahigh purity silicon can be used to produce chlorosilanes under reasonable reaction conditions by employing a catalyst containing one or more of Co, Mo, W. The process may be incorporated into an integral plant for the production of polycrystalline silicon.

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Heldenstein, Germany

Karl-Heinz Rimboeck