Hoechst Aktiengesellschaft

Hoechst Celanese Corporation

Other

Karl-Friedrich Doessel

Juergen Lingnau

Ralph R Dammel

Richard Vicari

Mohammad Aslam

Kenneth G Davenport

Wilson B Ray

Ulrich Epple

Gerhard Brindoepke

Holger Schmidt

Bernd F Fischer

Juergen Theis

Guenther Schmidt

Ernst G Schlosser

Copolymers of olefinically unsaturated monomers, wherein at least one of the monomers is an isomer mixture of a cyclic or polycyclic olefinically unsaturated compound, which mixture contains a mass fraction from 8 to 50 per cent of at least one isomer of the main component in addition to this main component. The copolymers are useful, for example, in coating compositions.

Copolymers comprising cyclic or polycyclic monomers having a specific

A magnetooptic layer made from rare-earth metals and transition metals exhibits a gradient in the alloy composition over the layer depth, and has a coercive field strength of more than 8 kOe in the temperature range of .DELTA.T=100.degree. C. around the compensation temperature T.sub.comp. The layer is fabricated with a dynamic sputter process, in which the substrates to be coated are led past one or a plurality of sputter targets, arranged in a common plane parallel to the track of the substrates. A mask is located between the sputter targets and the substrates.

Magnetooptic layer and a process for its fabrication

A positive radiation-sensitive mixture is disclosed comprising a compound which forms an acid under the action of high-energy radiation and an acid-cleavable compound, wherein the compound which forms an acid contains aromatically bound chlorine or bromine and has a pK.sub.a value of less than about 12 or is a derivative of a compound having such a pK.sub.a value. The mixture and the recording material produced therefrom have a relatively high-sensitivity and improved resolution and, in addition, exhibit no scumming after development.

Positive radiation-sensitive mixture and recording material produced

A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pK.sub.a value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

Radiation-curable composition and radiation-sensitive recording material

3-substituted-4-hydroxy- and 4-acetoxystyrene compounds, especially 3,5-di(methyl, bromo or chloro)-4-acetoxystyrene as well as a process for its preparation. 2,6-dimethylphenol is acylated with acetic anhydride and HF catalyzed to produce 3,5-dimethyl-4-hydroxy-acetophenone. After subsequent esterification with acetic anhydride and catalyzed hydrogenation to form 1-(3',5'-dimethyl-4'-acetoxyphenyl)ethanol, this intermediate is then dehydrated with an acid and a polymerization inhibitor to produce 3,5-dimethyl-4-acetoxystyrene.

Process for the production of 3,5-disubstituted-4-acetoxystyrene

A positive radiation-sensitive mixture is disclosed containing a compound which forms an acid under the influence of actinic radiation, and an acid-cleavable compound, wherein the acid-cleavable compound is monomeric and contains an acetal group whose aldehyde or ketone component has a developer solubility of about 0.1 to 100 g/l and a boiling point above about 150.degree. C. The mixture does not exhibit different development properties, even at different 'holding times', and therefore exhibits a wide processing latitude and makes possible a high structural resolution.

Positive radiation-sensitive mixture containing monomeric acid-cleavable

Preparation of 3,5-disubstituted-4-acetoxystyrene

A positive radiation-sensitive mixture is disclosed comprising a compound which forms an acid under the action of actinic radiation, and an acid-cleavable compound, the acid-cleavable compound producing, as cleavage product, an aromatically-substituted alcohol of the general formula I. The radiation-sensitive mixture according to the invention

Positive radiation-sensitive mixture and radiation-sensitive recording

The present invention relates to a process for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene wherein the 3- or 3,5-substitution is independently C.sub.1 to C.sub.10 alkyl, chlorine, bromine, iodine, --NO.sub.2, --NH.sub.2, or --SO.sub.3 H, a process for its polymerization, hydrolysis, and use in a variety of compositions.

Process for the production of 3-mono or 3,5 dihalogenated

3,5-disubstituted-4-acetoxystyrene and process for its production

The invention relates to a positive radiation-sensitive mixture containing a compound which forms an acid under the action of actinic radiation, an acid-cleavable compound, and a binder, wherein the acid-cleavable compound comprises a monomeric silylenol ether. The radiation-sensitive mixture described has a better shelf life than the prior art products and a high structural resolution.

Positive radiation-sensitive mixture, using a monomeric silylenol ether

Process for the production of 3-mono or

Process for the production of 3-mono or 3,5

Disclosed is an electrophotographic recording material comprising a photoconductive double layer disposed on an electrically conductive support, which double layer comprises a precoat layer and a photoconductor-containing topcoat layer. The interface region of the precoat and topcoat layers defines a mixing zone into which one or more of the constituents of the separate layers have diffused. A process for producing the electrophotographic recording material is also disclosed.

Electrophotographic recording material having a photoconductive double

An electrophotographic recording material is described for preparing a printing form or a printed circuit, comprising a layer support and a photoconductive layer comprised of photoconductor, sensitizer and/or activator, if appropriate further additives which improve surface texture and/or adhesion and a high molecular weight binder which is soluble in an alkaline aqueous or alcoholic solution and the photoconductive layer of which recording material contains as binder the product of reacting a sulfonyl isocyanate of the general formula R--SO.sub.2 --NCO in which R is alkenyl having up to 4 carbon atoms or phenyl which can be substituted by alkyl having up to 3 carbon atoms, with a hydroxyl-containing polymer in a molar ratio within the range of (0.5 to 1):1.

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Wiesbaden, Germany

Karl-Friedrich Doessel