Carl Zeiss Smt Gmbh

Carl-Zeiss-Smt Ag

Other

Carl Zelss Smt Ag

Karl-Eugen Aubele

Thorsten Rassel

Erich Merz

Klaus Rief

Hubert Holderer

Ulrich Weber

Alexander Kohl

Johannes Lippert

Wolfgang Hummel

Jochen Weber

Raoul Reiner

Markus Neumaier

Juergen Fischer

Michael Muehlbeyer

Stefan Schoengart

Yim-Bun Patrick Kwan

Stefan Xalter

Hermann Bieg

Uy-Liem Nguyen

Martin Schmidt

Saverio Sanvido

Baerbel Trossbach

Stephan Back

Baerbel Schwaer

Michael Mühlbeyer

Marco Jassmann

Sven Ulmer

Jürgen Fischer

Stefan Schöngart

Bärbel Trossbach

A projection exposure apparatus for microlithography includes an optical element actuatable by a first and a second actuator. The actuators are controlled via control intervals in such a way that a minimum deflectability predefined in accordance with a preselectable parameter is guaranteed at every point in time of the control.

Method for moving an optical element of a projection exposure apparatus for microlithography

The present disclosure relates to a method for the production and/or adjustment of an optical arrangement of a projection illumination system, in which at least one actuator is used to set the position of at least one optical element to be manipulated by moving the optical element incrementally with a specific increment size. The increment size of the movement increments is set as a function of the distance of the optical element from the desired position, with the distance being represented by a distance value. If the distance value is above a first threshold value, a substantially constant increment size is set, while the specific increment size decreases as the distance from the desired position decreases if the distance value is below the first threshold value. Alternatively or additionally, a pre-specified deviation from the specific increment size and/or from a pre-specified increment size change rate results in a warning signal and/or ceasing of the movement.

Positioning method for an optical arrangement of a projection illumination system

An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.

Optical assembly

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure facility

Imaging device in a projection exposure machine

The disclosure generally relates to methods, devices, systems and components configured to position an element in a lens assembly, such as a lens assembly for microlithography, in which the element to be positioned is moved from an actual position to a target position via at least one actuator, and in which at least the positioning movement of the actuator is superimposed with an oscillating movement.

Method and a device for positioning an element in an optical system

An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

A method is used for dynamic manipulation and/or for adjustment of a module or a component in an optical system, in particular in a microlithographic projection exposure objective for manufacture of semiconductors. The module or component is displaced by at least two actuators, which have detectors for determining at least their relative path displacements. A position of the module or component is determined by at least two sensors, the sensors and the actuators, with their detectors communicating with one another in the manner of a control loop. At least one impulse is exerted on the module or component by the actuators. The timing of the impulse can be deliberately varied, to which end the displacement of the actuators is carried out with a time-variant velocity profile dictated as a function of a determined position s of the module or component. A position s of the module or component is re-determined after the velocity profile, has been executed. The aforementioned method steps are repeated until the desired position s of the module or component is reached.

Method for dynamic manipulation of a position of a module in an optical system

Growing community of inventors

Geislingen/Steige, Germany

Karl-Eugen Aubele