Applied Materials, Inc.

Quantum Global Technologies LLC

Karl Brueckner

Hong Peng Wang

Brian T West

Marc O'Donnell Schweitzer

Jennifer Watia Tiller

A method of fabricating a process chamber component having a textured surface with raised features. The method comprises providing a process chamber component having a surface, and forming a patterned resist layer on the process chamber component, the patterned resist layer having apertures that expose portions of the surface of the process chamber component therethrough. A textured surface having raised features is formed on the process chamber component by propelling grit particles with a gas that is pressurized to a pressure sufficiently high to cause the grit particles to erode and remove material from the surface.

Textured chamber surface

A method of fabricating a process chamber component having a textured surface includes applying a resist layer on an underlying surface of the component. A predetermined pattern of apertures is formed in the resist layer that exposes the underlying surface of the component. The underlying surface is etched through the apertures in the resist layer to form a textured surface having raised features with top corners. The resist layer is removed, and a treatment step is performed to form top corners that are rounded. In another method, the textured surface is formed by providing a patterned mask having apertures above the surface of the component. A material is sprayed through the apertures in the patterned mask and onto the surface to form a textured surface with raised features having the material.

In a method of cleaning a surface of a substrate processing chamber component to remove process deposits, the component surface is cooled to a temperature below about &#x2212;40&#xb0; C. to fracture the process deposits on the surface. The surface can be cooled by immersing the surface in a low temperature fluid, such as liquid nitrogen. In another version, the component surface is heated to fracture and delaminate the deposits, and optionally, subsequently rapidly cooled to form more fractures. The component surface cleaning can also be performed by bead blasting followed by a chemical cleaning step.

Cleaning of chamber components

In a method of cleaning metal-containing deposits such as tantalum from a surface of a process chamber component, such as a metal surface, the surface is immersed in a cleaning solution. In one version, the cleaning solution is a solution having HF and HNOin a ratio that removes deposits from the surface substantially without eroding the surface. In another version, the cleaning solution is a solution having KOH and HO. The solution can be treated after cleaning the surface to recover tantalum-containing materials and one or more of the cleaning solutions.

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Santa Clara, CA, United States of America

Karl Brueckner