Applied Materials Gmbh & Co Kg

Applied Materials, Inc.

Karl-Albert Keim

Stefan Bangert

Stefan Hein

Jose Manuel Dieguez-Campo

Wolfgang Buschbeck

Andreas Lopp

Tobias Stolley

Stefan Keller

Jörg Krempel-Hesse

Markus Hanika

Guenter Klemm

Michael Konig

Juergen Bruch

Harald Rost

Jurgen Schroeder

Uwe SCHÜßLER

The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the nonuniform coating of a substrate. By having the relative movement between magnetic field and target alternately reverse its direction, the effect of the magnetic field distortion can be compensated. This yields greater uniformity of the coating on a substrate to be coated.

Method for operating a sputter cathode with a target

Growing community of inventors

Budingen, Germany

Karl-Albert Keim