Novellus Systems Incorporated

Karena Shannon

Bart Jan Van Schravendijk

Kaihan Abidi Ashtiani

Nerissa Sue Draeger

Provided herein are integration-compatible dielectric films and methods of depositing and modifying them. According to various embodiments, the methods can include deposition of flowable dielectric films targeting specific film properties and/or modification of those properties with an integration-compatible treatment process. In certain embodiments, methods of depositing and modifying flowable dielectric films having tunable wet etch rates and other properties are provided. Wet etch rates can be tuned during integration through am integration-compatible treatment process. Examples of treatment processes include plasma exposure and ultraviolet radiation exposure.

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San Jose, CA, United States of America

Karena Shannon