Massachusetts Institute of Technology

Gvd Corporation

Other

The Charles Stark Draper Laboratory, Inc.

Analog Devices,inc.

King Fahd University of Petroleum and Minerals

Cornell Research Foundation Inc.

University of Chicago

Eni S.p.a.

Luxembourg Institute of Science and Technology

Semiconductor Research Corporation

Karen K Gleason

Miles C Barr

Erik Schroeder Handy

W Shannan O'Shaughnessy

Hilton G Pryce Lewis

Andong Liu

Vladimir Bulovic

David J Edell

Herbert H Sawin

Rong Yang

Neeta P Bansal

Aleksander J White

Scott J Limb

Edward F Gleason

Minghui Wang

Kelvin Chan

Lionel Cooper Kimerling

Anastasios John Hart

Kripa K Varanasi

Christopher Kemper Ober

George Barbastathis

Salmaan H Baxamusa

Heather A Clark

Sanha Kim

Dhiman Bhattacharyya

William Jay Arora

John M Dubach

Aleksandr J White

Daniel Herr

Anna M Coclite

Sung Gap Im

Wyatt E Tenhaeff

Hossein Sojoudi

Jingjing Xu

Peter Kovacik

John Lock

Michal Lipson

Yosef Stein

Brian Lee Wardle

Paul Franklin Nealey

Minglin Ma

Qingguo Wu

Adam T Paxson

Clark K Colton

Jing Kong

Riccardo Po

T Alan Hatton

Patrick Choquet

Gregory C Rutledge

Fikile Richard Brushett

Xianwen Mao

Tonio Buonassisi

Zafarullah Khan

Yue Zhou

Estelle Cohen

Chiara Carbonera

Hyesung Park

Malancha Gupta

Dan Soto

Amanda R Dilenno

Tyler Phillip Martin

Leslie S S Loo

April Ross

Shashi K Murthy

Nicolas D Boscher

Yasser Ashraf Gandomi

Charles Wan

Meysam Heydari Gharahcheshmeh

Antoni Forner-Cuenca

Michael C Kwan

Xiaoxue Wang

David C Borrelli

Asli Ugur Katmis

Yaron Segal

Baby Reeja Jayan

Hafiz Zahid Shafi

Do Han Kim

Jose L Yagüe

Hyo Seon Suh

Kenneth K S Lau

Priya Moni

Jill A Rowehl

Christy D Petruczok

Rachel M Howden

William Shannan O'Shaughnessy

Sreeram Vanddiraju

Seth Johnson

Yu Mao

Polymers comprising fluorinated side chains that can be used for water resistance coatings on substrates and are deposited by initiated chemical vapor deposition are generally described.

Durable water resistant coatings

Systems and methods involving nanomaterial-based electrodes, such as supercapacitor and battery electrodes that can be flexible, are described.

Supercapacitors and other electrodes and methods for making and using same

The present disclosure relates to electrodes comprising a polymer film and a substrate, wherein the polymer film has a thickness of about 5 nm to about 600 nm. The present disclosure also relates to electrochemical cells and batteries comprising the electrodes disclosed herein. The present disclosure also relates to methods of making the electrodes disclosed herein.

Ultrathin conformal oCVD PEDOT coatings on porous electrodes and applications thereof

Disclosed are methods for fabricating supercapacitors (SCs) via vapor printing, specifically oxidative chemical vapor deposition (oCVD). Also disclosed are methods of using the supercapacitors, in particular for energy storage devices and photovoltaics.

Monolithic flexible supercapacitors, methods of making and uses thereof

Disclosed are methods of preparing antifouling coatings on reverse osmosis membranes with initiated vapor deposition or oxidative vapor deposition. The coatings enhance the stability and lifetime of membranes without sacrificing performance characteristics, such as permeability or salt retention.

Ultrathin, conductive and fouling-resistant zwitterionic polymer films

Disclosed are compositions of electroactive polymers (EAPs) having improved performance stability. In the EAP compositions, a cross-linked polymer is deposited onto the surface of the EAP by vapor-deposition methods. Upon contact with an aqueous solution (e.g., an aqueous electrolyte solution), the vapor-deposited polymeric network becomes a hydrogel that encapsulates the EAPs. By modulating precursors and vapor deposition conditions, the mesh size of the resultant hydrogel coatings can be controlled to accommodate the key species that interact with the EAPs.

Enhancing performance stability of electroactive polymers by vapor-deposited organic networks

Disclosed is a method for the fabrication of polymeric topcoat via initiated chemical vapor deposition (iCVD) or photoinitiated chemical vapor deposition (piCVD) in conjunction with directed self-assembly (DSA) of block copolymers to generate high resolution patterns. A topcoat deposited by iCVD or piCVD allows for conformal, ultra-thin, uniform, pinhole-free coatings. iCVD or piCVD topcoat enables the use of a diversity of block copolymer (BCP) materials for DSA and facilitates the direct and seamless integration of the topcoats for a pattern transfer process.

Method of forming topcoat for patterning

Methods of printing nanoparticulate ink using nanoporous print stamps are disclosed. A nanoporous print stamp can include a substrate, a patterned arrangement of carbon nanotubes disposed on the substrate, and a secondary material disposed on the carbon nanotubes to reduce capillary-induced deformation of the patterned arrangement of carbon nanotubes when printing nanoparticulate ink. Some methods include loading a nanoporous print stamp with nanoparticulate colloidal ink such that the nanoparticulate colloidal ink is drawn into microstructures of the patterned arrangement of carbon nanotubes via capillary wicking. Nanoparticulate colloidal ink can include nanoparticles dispersed in a solution. The method also includes contacting a nanoporous stamp to a target substrate to form nanoscale contact points between the target substrate and the patterned arrangement of carbon nanotubes of the nanoporous print stamp so that nanoparticulate colloidal ink is drawn out of the nanoporous print stamp and onto the target substrate to form a pattern.

Nanoporous stamp printing of nanoparticulate inks

Liquid-impregnated textured coatings containing one or more materials on a variety of surfaces are described herein. The coatings can be prepared by chemical vapor deposition techniques or other techniques known in the art. The texture can be random, fractal, or patterned. The texture can be pores, cavities, and/or micro- and/or nanoscale features/structures. The capillary forces arising from the nano- or microscopic texture of the coating stabilizes the liquid within the textured features and at the surface of the coating resulting in non-wetting properties for a variety of surfaces. They coatings may be formed in a single layer or as multiple layers. In order to maximize ease of deposition and processing, the coating may be formed of graded composition to optimize both bulk and surface properties without the need for multiple coatings.

Liquid-impregnated coatings and devices containing the same

Disclosed are methods of preparing antifouling and chlorine-resistant coatings on reverse osmosis membranes with initiated chemical vapor deposition. The coatings enhance the stability and lifetime of membranes without sacrificing performance characteristics, such as permeability or salt retention.

Antifouling and chlorine-resistant ultrathin coatings on reverse osmosis membranes

Described are materials and methods for fabricating low-voltage MHz ion-gel-gated thin film transistor devices using patternable defect-free ionic liquid gels. Ionic liquid gels made by the initiated chemical vapor deposition methods described herein exhibit a capacitance of about 1 &#x3bc;F cmat about 1 MHz, and can be as thin as about 20 nm to about 400 nm.

Vapor-deposited nanoscale ionic liquid gels as gate insulators for low-voltage high-speed thin film transistors

Described herein are facile, one-step initiated plasma enhanced chemical vapor deposition (iPECVD) methods of synthesizing hyper-thin (e.g., sub-100 nm) and flexible metal organic covalent network (MOCN) layers. As an example, the MOCN may be made from zinc tetraphenylporphyrin (ZnTPP) building units. When deposited on a membrane support, the MOCN layers demonstrate gas separation exceeding the upper bounds for multiple gas pairs while reducing the flux as compared to the support alone.

Ultra-thin, pinhole-free, flexible metal-organic films

A nanoporous stamp for printing a variety of materials is disclosed. The nanoporous stamp may include a substrate and an array of carbon nanotubes disposed on and attached to the substrate. The array of carbon nanotubes can have an etched top surface and a wettable, nanoporous structure, and may include a coating thereon. The nanoporous stamp can be used in a variety of printing applications, and can print, among other things, colloidal and non-colloidal inks on a variety of substrates with a high degree of accuracy and fidelity.

Nanoporous stamp for flexographic printing

Described herein are reactors capable of sequentially or simultaneously depositing thin-film polymers onto a substrate by oxidative chemical vapor deposition (oCVD), initiated chemical vapor deposition (iCVD), and plasma-enhanced chemical vapor deposition (PECVD). The single-unit CVD reactors allow for the use of more than one CVD process on the same substrate without the risk of inadvertently exposing the substrate to ambient conditions when switching processes. Furthermore, the ability to deposit simultaneously polymers made by two different CVD processes allows for the exploration of new materials. In addition to assisting in the deposition of polymer films, plasma processes may be used to pretreat substrate surfaces before polymer deposition, or to clean the internal surfaces of the reactor between experiments.

Single-unit reactor design for combined oxidative, initiated, and plasma-enhanced chemical vapor deposition

Disclosed is an organic coating with a high degree of global planarization. Further disclosed is an iPECVD-based method of coating a substrate with an organic layer having a high degree of global planarization. Disclosed is a flexible, alternating organic and inorganic multi-layer coating with low water permeability, a high-degree of transparency, and a high-degree of global planarization. Also disclosed is an iPECVD-based method of coating a substrate with the alternating organic and inorganic multi-layer coating.

Methods of coating surfaces using initiated plasma-enhanced chemical vapor deposition

Growing community of inventors

Cambridge, MA, United States of America

Karen K Gleason