Fujitsu Corporation

Kaoru Usui

Shou Chiba

Hiroyuki Itou

Hiroshi Iizuka

Yoshio Shimano

A photo amplifying apparatus for amplifying wavelength division multiplexed signals includes a specific wavelength measuring unit for measuring a specific wavelength at a measuring point, a total power measuring unit for measuring all wavelengths at the measuring point, and an output control unit for controlling the output of the photo amplifying apparatus based on the light power measured by the specific wavelength measuring unit and the total power measuring unit. Since the photo amplifying apparatus measures both the specific wavelength and all wavelengths, the photo amplifying apparatus can determine change in the number of multiplexed wavelengths and the gain gradient of the photo signals, and can properly control its output level.

Optical amplifying apparatus for wavelength division multiplexed signals

An apparatus for manufacturing a semiconductor device having: a process chamber capable of being evacuated; a coil unit for generating an alternating magnetic field in the process chamber; a conductive partition unit disposed in the process chamber for defining an inner space and generating another alternating magnetic field which cancels a change in the alternating magnetic field generated in the inner space, the partition unit allowing gas to be transported between the inner space and a space outside of the inner space; a pipe for supplying process gas to the process chamber; and a pipe for exhausting gas from said process chamber. The gas supply pipe and gas exhaust pipe have a plurality of openings directed to the inner space. Radicals are efficiently generated by inductively coupled plasma, and efficiently transported by a gas flow into the inner space.

Plasma process with radicals

An apparatus for manufacturing a semiconductor device having: a process chamber capable of being evacuated; a coil unit for generating an alternating magnetic field in the process chamber; a conductive partition unit disposed in the process chamber for defining an inner space and generating another alternating magnetic field which cancels a change in the alternating magnetic field generated in the inner space, the partition unit allowing gas to be transported between the inner space and a space outside of the inner space; a pipe for supplying process gas to the process chamber; and a pipe for exhausting gas from said process chamber. The gas supply pipe and gas exhaust pipe have a plurality of openings directed to the inner space. Radicals are efficiently generated by inductively coupled plasma, and efficiently transported by a gas flow into time inner space.

A plasma generating apparatus includes a vacuum chamber, an inductive-coupling coil wound around the vacuum chamber, a pair of parallel-planar electrodes, each of which electrode has a center on a central axis of the inductive-coupling coil within the vacuum chamber, and is disposed vertically against the central axis, a radio-frequency power supply, and a radio-frequency matching circuit coupled to the radio-frequency power supply. The radio-frequency matching circuit is coupled to at least one of the inductive-coupling coil and the pair of parallel-planar electrodes. The pair of parallel-planar electrodes and the inductive-coupling coil driven by the radio-frequency power supply carry out capacitive-coupling and inductive-coupling so as to be associated with each other, so that capacitively-coupled plasma and inductively-coupled plasma are generated within the vacuum chamber.

Growing community of inventors

Kawasaki, Japan

Kaoru Usui