Fujikin Inc.

Tohoku University

Tokyo Electron Limited

Other

Futikin Incorporated

Fuiikin Incorporated

Fujilin Incorporated

Kaoru Hirata

Kouji Nishino

Nobukazu Ikeda

Katsuyuki Sugita

Ryousuke Dohi

Masaaki Nagase

Atsushi Hidaka

Shinya Ogawa

Atsushi Matsumoto

Takashi Hirose

Keisuke Ideguchi

Tsutomu Shinohara

Toshihide Yoshida

Yohei Sawada

Hisashi Tanaka

Tomokazu Imai

Koji Kawada

Masahiko Takimoto

Kazuyuki Miura

Takatoshi Nakatani

Tsuyoshi Shimazu

Takahiro Imai

Shoichi Hino

Masahito Saito

Tadahiro Ohmi

Satoru Yamashita

Kazuyuki Morisaki

Keiji Hirao

Masafumi Kitano

Naofumi Yasumoto

Hiroyuki Ito

Takeshi Nakamura

Takahiro Matsuda

Kenji Aikawa

Masayoshi Esashi

Ryosuke Dohi

Kazuteru Tanaka

Masayoshi Kawashima

Atushi Hidaka

Atsushi Nagata

Kosuke Sugimoto

Tetsuo Naritomi

Toru Hirai

A controller capable of improving the disappearance resistance of a synthetic resin coating of a diaphragm, and a vaporization supply device comprising the controller. The controller includes a body having an inflow passage and an outflow passage, a valve seat provided between the inflow passage and the outflow passage, a diaphragm capable of being seated on or separated from the valve seat, and an actuator for causing the diaphragm to be seated on and separated from the valve seat. The material of the valve seat is nickel-based, and the diaphragm is provided with a synthetic resin coating on a surface of a side to be brought into contact with the valve seat.

Controller and vaporization supply device

A pressure control device includes a pressure control valve, a flow resistance provided downstream of the pressure control valve, a first pressure sensor for measuring a gas pressure between the pressure control valve and the flow resistance, a second pressure sensor for measuring a gas pressure downstream of the flow resistance, and a calculation control circuit connected to the first pressure sensor and the second pressure sensor, wherein the pressure control device controls the gas pressure downstream of the flow resistance by adjusting an opening degree of the pressure control valve based on an output of the second pressure sensor regardless of an output of the first pressure sensor control, and calculates the flow rate of the gas downstream of the flow resistance, based on the outputs of the first and the second pressure sensors.

Pressure control device

A flow rate control device () includes a control valve () having a valve element and a piezoelectric element for moving the valve element, and an arithmetic processing circuit () for controlling an operation of the control valve, wherein the arithmetic processing circuit is configured to receive an external command signal SE corresponding to a target flow rate when opening the control valve from a closed state so that a gas flows at the target flow rate, and to generate an internal command signal Eoutput to a driving circuit for determining a voltage applied to the piezoelectric element based on the external command signal, the internal command signal is a signal that rises with time from zero and converges to a value of the external command signal, and is generated such that a slope at the time of initial rise and a slope immediately before convergence are smaller than a slope therebetween.

Flow rate control device and flow rate control method wherein an internal command signal is generated by a combination of first order lag process and ramp process

The flow rate control deviceincludes a control valve, a restriction partprovided downstream of the control valve, an upstream pressure sensorfor measuring a pressure Pbetween the control valveand the restriction part, a differential pressure sensorfor measuring a differential pressure ΔP between the upstream and the downstream of the restriction part, and an arithmetic control circuitconnected to the control valve, the upstream pressure sensor, and the differential pressure sensor

Flow rate control device

A flow rate control deviceincludes a control valveprovided in a flow path, a flow rate measurement unitfor measuring fluid flow rate controlled by the control valve, and a controller. The controlleris configured so as to control the opening/closing operation of the control valveto match the measurement integral flow rate based on the signal outputted from the flow rate measurement unit (Vn+Vd) to the target integral flow rate Vs.

Flow rate control device and flow rate control method

An abnormality detection method is performed in a gas supply system including a flow rate control device having a restriction part, a control valve, a flow rate control pressure sensor for measuring upstream pressure, and a control circuit. The inflow pressure sensor measures the supply pressure. An upstream on/off valve is provided upstream of the inflow pressure sensor. The method includes closing the upstream on/off valve when the gas flows at a controlled flow rate at the downstream of the restriction part by controlling an opening degree of the control valve based on the output of the flow rate control pressure sensor; measuring a drop in supply pressure on the upstream side of the control valve after closing the upstream on/off valve while keeping the control valve open; and detecting the presence or absence of abnormality in the flow rate control device based on the measured supply pressure drop.

Abnormality detection method for flow rate control device, and flow rate monitoring method

A diaphragm valve includes a body () having a flow path (), a seat () formed in the flow path (), a metal diaphragm () for opening and closing the flow path (), a pair of clamping parts () and () for claiming peripheral edge portions of the metal diaphragm () to fix the metal diaphragm () to the body (), and an actuator () for abutting the metal diaphragm () to the seat () or separating the metal diaphragm from the seat (), wherein a fluorine resin coating is formed on a seat side surface () of the metal diaphragm () at least in a contact region (B-A) with the seat () in a region (C) surrounded by a clamping region (D-C) between the seat side surface () and one of the pair of clamping portions (), excluding the clamping region (D-C).

Diaphragm valve

A pressure-type flow rate control device includes a restriction part; a control valve provided upstream of the restriction part; an upstream pressure sensor for detecting pressure between the restriction part and the control valve; and an arithmetic processing circuit connected to the control valve and the upstream pressor sensor. The device is configured to perform flow rate control by controlling the control valve according to an output of the upstream pressure sensor. The arithmetic processing circuit performs an operation of closing the control valve in order to reduce a flow rate of a fluid flowing through the restriction part, and performs an operation of closing the control valve by feedback control in which a target value is an exponential function more gradual than the pressure drop characteristic data when a gas flows out of the restriction part.

Pressure-type flow control device and flow control method

The liquid level meter according to the present invention includes a resistive temperature detector, a temperature measuring body located above it, a temperature detecting unit detecting temperatures of the resistive temperature detector and the temperature measuring body, a current controlling unit determining a current value to be flowed through the resistive temperature detector so that the resistive temperature detector and the temperature measuring body become a predetermined temperature difference, a power supply unit supplying the current of the determined current value to the resistive temperature detector, and a liquid level detecting unit detecting a position of a liquid level. The liquid level detecting unit detects the change in the relative position of the liquid level relative to the resistive temperature detector by determining whether a change width of the current value flowing through the resistive temperature detector during a predetermined period of time is positive or negative, and whether the change width is not less than a predetermined value. As a result, the position of the liquid level can be accurately detected without being affected by the variation in the characteristics of the resistive temperature detector.

Liquid level meter, vaporizer equipped with the same, and liquid level detection method

A self-diagnosis method of a flow rate control device includes: a step (a) for measuring a pressure drop characteristic after a pressure control valve () has been changed to a closed state from a state where a fluid flows from the upstream side of the pressure control valve with the opening of a flow rate control valve () is larger than a restriction part; a step (b) for measuring the pressure drop characteristic after the pressure control valve has been changed to the closed state from a state where the fluid flows from the upstream side of the flow rate control valve to the downstream side with the opening of the flow rate control valve is smaller than the restriction part; a step (c) for determining whether there is an abnormality by comparing the pressure drop characteristic measured in step (a) with a corresponding reference pressure drop characteristic; a step (d) for determining whether there is an abnormality by comparing the pressure drop characteristic measured in step (b) with a corresponding reference pressure drop characteristic; and a step (e) for determining that there is an abnormality in the flow rate control valve when it is determined that there is an abnormality only in the step (d).

Self-diagnosis method for flow rate control device

A piezoelectric element-driven valveincluding a main body, a valve element, piezoelectric actuators, a plurality of cylindrical actuator boxes arranged in series, a cylindrical outer connecting jig detachably connecting the adjacent actuator boxes and having an opening for drawing out wiring, a plurality of piezoelectric actuators accommodated in the actuator box respectively in the same direction, and a cylindrical inner connecting jig slidably accommodated in the outer connecting jig and having an opening for positioning the adjacent piezoelectric actuators and drawing out wiring.

Piezoelectric driven valve, pressure-type flow rate control device, and vaporization supply device

An abnormality detection method performed using a flow rate control device including a restriction portion, a control valve, a first pressure sensor, a second pressure sensor, and a downstream valve, includes a step of changing the control valve and the downstream valve from an open state to a closed state, a step of measuring an upstream pressure or a downstream pressure in the closed state, and at least one step of (a) extracting an upstream pressure at a point when a difference between the upstream pressure and the downstream pressure reaches a predetermined value as an upstream convergence pressure, and extracting the downstream pressure as a downstream convergence pressure, and (b) extracting the time from a point when the control valve are changed to a closed state to a point when a difference between the upstream pressure and the downstream pressure reaches a predetermined value as a convergence time.

Flow rate control device and abnormality detection method using flow rate control device

A flow rate control method performed using a flow rate control devicecomprising a first control valveprovided in a flow path, a second control valveprovided downstream of the first control valve, and a pressure sensorfor measuring fluid pressure downstream of the first control valve, the method comprising steps of: (a) closing the opening of the first control valve from a state in which, while controlling the opening of the first control valve based on an output of the pressure sensor so as to be the first flow rate, maintaining the opening of the second control valve in an open state, and flowing a fluid at the first flow rate; and (b) based on the output of the pressure sensor, the pressure remaining downstream of the first control valve is controlled by adjusting the opening of the second control valve, and flowing the fluid at the second flow rate downstream of the second control valve.

Flow rate control method and flow rate control device

Growing community of inventors

Osaka, Japan

Kaoru Hirata