Sumitomo Chemical Company, Limited

Kaoru Araki

Koji Ichikawa

Yasunori Uetani

Satoshi Yamaguchi

Tatsuro Masuyama

Yoshiyuki Takata

Akira Kamabuchi

Takayuki Miyagawa

Takakiyo Terakawa

A resist composition which contains a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein Rrepresents a hydrogen atom, a halogen atom or a Cto Calkyl group that may have a halogen atom, Lrepresents a single bond or *-L-CO&#x2014;O-(L-CO&#x2014;O)&#x2014; where * represents a binding position to an oxygen atom, Land Lindependently represent a Cto Cdivalent hydrocarbon group, g represents 0 or 1, and Rrepresents a Cto Cliner or branched alkyl group except for a tertiary alkyl group.

Resist composition

Salt and photoresist composition comprising the same

A chemically amplified resist composition comprising: (A) a salt represented by the formula (I): wherein Rrepresents a C1-C30 hydrocarbon group etc., Qand Qeach independently represent a fluorine atom etc., andArepresents at least one organic cation selected from a cation represented by the formula (Ia): wherein P, Pand Peach independently represent a C1-C30 alkyl group etc.,a cation represented by the formula (Ib): wherein Pand Peach independently represent a hydrogen atom etc., and a cation represented by the formula (Ic): wherein P, P, P, P, P, P, P, P, P, P, Pand Peach independently represent a hydrogen atom etc., B represents a sulfur or oxygen atom and m represents 0 or 1,(B) a salt represented by the formula (II):A'E&#x2003;&#x2003;(II)wherein A&#x2032;represents at least one organic cation selected from cations represented by the above-mentioned formulae (Ia), (Ib) and (Ic), and Erepresents at least one organic anion selected from an anion represented by the formula (II-1):OSQ&#x2003;&#x2003;(II-1)wherein Qrepresents a C1-C10 perfluoroalkyl group, and an anion represented by the formula (II-2): wherein Qrepresents a C1-C10 perfluoroalkyl group, and(C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.

Chemically amplified resist composition

A chemical amplification type positive resist composition is provided, comprising a resin which has at least one polymerization unit selected from a polymerization unit of 3-hydroxy-1-adamantyl acrylate and a polymerization unit of 3,5-dihydroxy-1-adamantyl (meth)acrylate, a polymerization unit of hydroxystyrene and a polymerization unit having a group uhstable to an acid, is itself insoluble or poorly soluble in an alkali but becomes alkali-soluble after said group unstable to an acid is dissociated by the action of an acid; and an acid generator, the composition being excellent in various abilities such as sensitivity, resolution, heat resistance, film retention ratio, applicability, exposure clearance, dry etching resistance and the like, particularly having further improved resolution and exposure clearance.

Chemical amplification type positive resist composition

Sulfonium salt and use thereof

Growing community of inventors

Kyoto, Japan

Kaoru Araki