Dnf Co., Ltd.

Kang Yong Lee

Sang Ick Lee

Myong Woon Kim

A Ra Cho

Won Mook Chae

Sang Jun Yim

Joong Jin Park

Sang Yong Jeon

Jeong Hyeon Park

Haeng Don Lim

Heang Don Lim

Provided are a novel metal triamine compound, a method for preparing the same, a composition for depositing a metal-containing thin film including the same, and a method for preparing a metal-containing thin film using the same. The metal triamine compound of the present invention has excellent reactivity, is thermally stable, has high volatility, and has high storage stability, and thus, it may be used as a metal-containing precursor to easily prepare a high-purity metal-containing thin film having high density.

Metal triamine compound, method for preparing the same, and composition for depositing metal-containing thin film including the same

The present invention relates to: a novel transition metal compound; a preparation method therefor; a composition for depositing a transition metal-containing thin film, containing the same; a transition metal-containing thin film using the composition for depositing a transition metal-containing thin film; and a method for preparing a transition metal-containing thin film. The transition metal compound of the present invention has high thermal stability, high volatility, and high storage stability, and thus a transition metal-containing thin film having high-density and high-purity can be easily prepared by using the same as a precursor.

Transition metal compound, preparation method therefor, and composition for depositing transition metal-containing thin film, containing same

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Sejong, South Korea

Kang Yong Lee