Samsung Electronics Co., Ltd.

Kang-Min Park

Byeongsang Kim

Jae-Chul Hwang

Jung-Jun Park

Hahn Park

JaeChul Hwang

Jungjun Park

Byeong-sang Kim

Yongjoon Hong

Heokjae Lee

Woo Jin Park

Dongil Yoon

Sung Baek Kim

Se Un Park

MinYoung Hwang

Jae Boo Kim

A removal apparatus for removing residual gases and a substrate treating facility for removing residual gases is disclosed. The residual gas removal apparatus includes a housing, a gas supply for providing a non-reactive gas into the housing, a supporting member provided to support a substrate and positioned in the housing, a heat radiating member spaced apart from the supporting member and positioned in the housing, and a heating unit for providing heat toward the supporting member and positioned between the heat radiating member and the supporting member.

Removal apparatus for removing residual gas and substrate treating facility including the same

An actuator unit, a robot including the same, and a reducing apparatus, the actuator unit including a driving unit; a sensor unit; a control unit; and a frame unit.

Actuator unit, robot including the same, and reducing apparatus

The robot including a main body, an arm connected to the main body, a hand connected to the arm, the hand including a hand base and a finger, and a hand bracket unit between the hand base and the finger or between the hand base and the arm, may be provided. The hand bracket unit may include a vibration damping member provided between the hand base and the finger or between the hand base and the arm, thereby damping vibration of the hand base or the finger.

Robot and substrate handling apparatus including the same

Growing community of inventors

Hwaseong-si, South Korea

Kang-Min Park