Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Hitachi, Ltd.

Hitachi High-tech Science Corporation

Hitachi High-tech Fine Systems Corporation

Hitachi High-technologies Corporaiton

Kaifeng Zhang

Takenori Hirose

Masahiro Watanabe

Teruaki Tokutomi

Tsuneo Nakagomi

Toshihiko Nakata

Yuta Urano

Shinichi Taniguchi

Takehiro Tachizaki

Shinji Homma

Tetsuya Matsui

Toshiyuki Nakao

Yoshiki Matoba

Akihiro Takeda

Hideaki Sasazawa

Shinji Honma

Toshinori Sugiyama

Akira Tobita

Takehiro Tatizaki

Tomonori Saeki

Provided is a spectroscopic measurement device capable of improving detection sensitivity to a change in a physical property value such as expansion of a sample to which energy is applied by an infrared ray or the like. The spectroscopic measurement device includes: a stage on which a sample is to be placed; an energy source configured to generate an energy beam to be emitted to a predetermined region of the sample; an electromagnetic wave source configured to generate an electromagnetic wave to be emitted to the sample; an objective lens configured to focus the electromagnetic wave in the predetermined region; two confocal detectors configured to detect the electromagnetic wave reflected by the sample; and a calculation unit configured to calculate, based on each of outputs of the confocal detectors, a change in a physical property value of the sample when the energy beam is emitted to the predetermined region.

Spectroscopic measurement device

Provided is a spectrometry apparatus that suppresses a reduction in usage efficiency of an irradiation energy of a light. A spectrometry apparatus of the disclosure includes a stage on which a sample is placed, an electromagnetic source that emits an electromagnetic wave, one or a plurality of optical elements that transform a spatial energy distribution of the electromagnetic wave and emit the electromagnetic wave, and a reflective objective lens that collects the electromagnetic wave after a transformation of the spatial energy distribution and irradiates the sample with the collected electromagnetic wave.

Spectrometry apparatus

To enhance the measurement sensitivity of a scanning probe microscope. In a cross sectional view, a cantilever includes a vertex portion that is a portion close to a sample and is covered by a metallic film, a ridge that is connected to the vertex portion and is covered by the metallic film, and an upper corner portion that is connected to the ridge. Here, the upper corner portion and a part of the ridge are portions to be irradiated with excitation light emitted from a light source of the scanning probe microscope.

Cantilever, scanning probe microscope, and measurement method using scanning probe microscope

A near-field scanning probe includes: a measurement probe that relatively scans a test sample; an excitation light irradiation system; a near-field light generation system that generates near-field light in a region including the measurement probe in response to irradiation with excitation light from the excitation light irradiation system; and a scattered light detection system that detects Rayleigh scattering and Ramen scattered light of the near-field light from the sample, generated between the measurement probe and the sample, and the near-field scanning probe is characterized in that the near-field light generation system includes a cantilever with a chip coated with a noble metal, and a tip of the chip is provided with a thin wire group including a plurality of carbon nanowires with a noble metal provided at ends thereof.

Near field scanning probe microscope, probe for scanning probe microscope, and sample observation method

Detection can be performed even for a thick inspection target object through time delay integration without degradation of spatial resolution. There is provided an X-ray inspection device configured to include: an X-ray source that generates X-rays; a transport unit that performs transporting a sample; a detecting unit that has a time delay integration type detector which detects X-rays generated by the X-ray source and transmitted through the sample transported by the transport unit; and a defect determining unit that processes a signal obtained by detecting the X-rays transmitted through the sample by the time delay integration type detector of the detecting unit and determines a defect in the sample. The transport unit performs transporting the sample while causing the sample to rotate in synchronization with the transporting when the sample passes in front of the time delay integration type detector of the detecting unit.

X-ray inspection method and X-ray inspection device

A method including inspecting, using an X-ray transmission image, internal defects in a TSV formed in a semiconductor wafer, and detecting the X-rays, and processing an X-ray transmission image. Therein, the detection of X-rays is configured such that: the detection azimuth of the X-rays, and the detection elevation angle of the X-rays relative to the X-ray source are determined on the basis of information on the arrangement interval, depth, and planar shape of structures formed in the sample. The angle of rotation of a rotating stage on which the sample is mounted is adjusted in accordance with the detection azimuth which has been determined, and the X-rays that have been transmitted through the sample are detected with the position of the detector set to the detection elevation angle which has been determined.

X-ray inspection method and device

To detect near-field light, which is generated by a thermal assist type magnetic head element, and leaking light with high sensitivity and to more accurately obtain the spatial intensity distribution of a near-field light generation area, an inspection apparatus for a thermal assist type magnetic head element is adapted so that a distance between a cantilever and the surface of a specimen and the excitation amplitude of the cantilever are set to be small to detect near-field light with high sensitivity by the suppression of an influence of other light components, a distance between the cantilever and the surface of the specimen and the excitation amplitude of the cantilever are set to be large to detect other light components present in the vicinity of near-field light with high sensitivity by the suppression of an influence of the amount of detected near-field light when other light components are measured.

Inspection method and its apparatus for thermal assist type magnetic head element

In a method and an apparatus for inspecting a thermally assisted magnetic recording head element, a specimen is mounted on a table movable in a plane of a scanning probe microscope device, evanescent light is generated from a portion of light emission of evanescent light of the specimen, scattered light of the evanescent light is detected by moving the table in the plane while a cantilever of the scanning probe microscope having a probe is vertically vibrated in the vicinity of a surface of the specimen, and an intensity distribution of the evanescent light emitted from the portion of light emission of evanescent light or a surface profile of the portion of light emission of evanescent light of the specimen is inspected using position information of generation of the evanescent light based on the detected scattered light.

Thermally assisted magnetic recording head inspection method and apparatus

To detect both of near-field light and magnetic field generated by a thermal assist type magnetic head and to perform inspection of the head, a cantilever of a scanning probe microscope has a lever in which a probe is formed, a thin magnetic film formed on a surface of the probe, and fine particles or thin film of noble metal or an alloy including noble metal formed on a surface of the magnetic film. An inspection apparatus has the cantilever, a displacement detection unit to detect vibration of the cantilever, a near-field light detection unit to detect scattered light caused by near-field light generated from a near-field light emitter and enhanced on the surface of the probe of the cantilever, and a processing unit to process signals obtained by detection with the displacement detection unit and the near-field light detection unit.

Cantilever of scanning probe microscope and method for manufacturing the same, method for inspecting thermal assist type magnetic head device and its apparatus

In a method of manufacturing this cantilever for the magnetic force microscope, a magnetic film is formed on a probe at a tip of the cantilever for the magnetic force microscope. When a non-magnetic rigid protective film is formed around the probe, the film is formed from the front of the probe of the cantilever for the magnetic force microscope at an angle (15&#xb0; to 45&#xb0;) and from the back of the probe of the cantilever for the magnetic force microscope in two directions each at an angle in a range of (15&#xb0; to 30&#xb0;).

Growing community of inventors

Tokyo, Japan

Kaifeng Zhang