Dalian University of Technology

Kai Zhao

Younian Wang

Yongxin Liu

Zixuan Su

The present disclosure relates to a power supply system for improving plasma uniformity and a method thereof, wherein the power supply system includes a signal generating device, a first electrode and a second electrode. The signal generator is respectively connected with a plurality of signal processing circuits and is used for generating a plurality of initial signals at different frequencies; the signal processing circuits are used for processing the initial signals at corresponding frequencies; the plurality of signal processing circuits are all connected with the first electrode; and the initial signals are processed by the signal processing circuits and then act on the plasma through the first electrode. The present disclosure may effectively process signals in different power supplies, improve the stability of plasma discharge, reduce the impact of the coupling effect between different power supplies, and realize the independent control of ion flux and ion energy.

Power supply system for improving plasma uniformity and method thereof

The present invention discloses a magnetic probe device. The magnetic probe device includes a magnetic probe body and a signal processing circuit, and an output end of the magnetic probe body is connected with an input end of the signal processing circuit; the signal processing circuit includes a first capacitor, a second capacitor, a Faraday shield and a step-up transformer, and the Faraday shield is fixedly arranged between a primary winding and a secondary winding of the step-up transformer; a center tap is arranged at the primary winding of the step-up transformer, and the center tap is grounded; and a first end of the primary winding is in series connection with the first capacitor, and a second end of the primary winding is in series connection with the second capacitor. The magnetic probe device provided by the present invention can improve the signal-to-noise ratio of a magnetic probe and the measurement accuracy of the magnetic field in plasma.

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Dalian, China

Kai Zhao