Taiwan Semiconductor Manufacturing Comp. Ltd.

Kai-Hsiung Cheng

Chih-Ming Ke

Heng-Jen Lee

Ho-Yung David Hwang

Wen-Zhan Zhou

Chen-Ming Wang

A method for controlling semiconductor production through use of a Focus Exposure Matrix (FEM) model includes taking measurements of characteristics of a two-dimensional mark formed onto a substrate, the two-dimensional mark including two different patterns along two different cut-lines, and comparing the measurements with a FEM model to determine focus and exposure conditions used to form the two-dimensional mark. The FEM model was created using measurements taken of corresponding two-dimensional marks formed onto a substrate under varying focus and exposure conditions.

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Taipei, Taiwan

Kai-Hsiung Cheng