Agency for Science, Technology and Research

Globalfoundries Singapore Pte. Ltd.

National University of Singapore

Kah Wee Ang

Purakh Raj Verma

Guowei Zhang

Mingbin Yu

Tsung-Yang Liow

Guo Qiang Patrick Lo

Qing Fang

Eu-Jin Andy Lim

Xuewei Feng

This disclosure describes a self-selective multi-terminal memtransistor suitable for use in crossbar array circuits. In particular, the memtransistor comprises a sapphire substrate that has a single-layer of polycrystalline molybdenum disulphide (MoS2) thin film formed on the surface of the substrate, wherein the MoS2 thin film comprise MoS2 grains that are oriented along terraces provided on the surface of the substrate. The memtransistor has a drain electrode and a source electrode that is formed on the MoS2 thin film such that a channel is defined in the MoS2 thin film between the drain and source electrodes, and a gate electrode formed above the channel, whereby the gate electrode is isolated from the channel by a gate dielectric layer.

Self-selective multi-terminal memtransistor for crossbar array circuits

An optical modulator and a method for manufacturing an optical modulator are provided. The optical modulator includes a first waveguide, a second waveguide, a modulating portion connected between the first waveguide and the second waveguide, the modulating portion being configured to receive an input signal from the first waveguide, to modulate the input signal and to supply a corresponding modulated input signal as an output signal to the second waveguide, wherein the modulating portion includes a semiconductor substrate, one end thereof being coupled to the first waveguide, and a corresponding opposite end thereof being coupled to the second waveguide, a Germanium rib provided on the substrate such that the input signal propagates through the Germanium rib along a longitudinal axis thereof, and a first electrode and a second electrode respectively provided on the substrate, wherein the Germanium rib is provided between the first electrode and the second electrode, and wherein the first electrode and the second electrode are configured to apply an electrical field to the Germanium rib in order to modulate the input signal propagating through the Germanium rib.

Optical modulator and method for manufacturing the same

A method and device are provided for forming an integrated Ge or Ge/Si photo detector in the CMOS process by non-selective epitaxial growth of the Ge or Ge/Si. Embodiments include forming an N-well in a Si substrate; forming a transistor or resistor in the Si substrate; forming an ILD over the Si substrate and the transistor or resistor; forming a Si-based dielectric layer on the ILD; forming a poly-Si or a-Si layer on the Si-based dielectric layer; forming a trench in the poly-Si or a-Si layer, the Si-based dielectric layer, the ILD, and the N-well; forming Ge or Ge/Si in the trench; and removing the Ge or Ge/Si, the poly-Si or a-Si layer, and the Si-based dielectric layer down to an upper surface of the ILD. Further aspects include forming an in-situ doped Si cap epilayer or an ex-situ doped poly-Si or a-Si cap layer on the Ge or Ge/Si.

Integration of germanium photo detector in CMOS processing

Growing community of inventors

Singapore, Singapore

Kah Wee Ang