United Microelectronics Corp.

Ka-Hing Wong

Ling-Hsin Tseng

David Sheu

D Y Sheu

Improved gas exhaust apparatus of a semiconductor plant for substantially reducing the accumulation of solid substance on the surface of a gas exhaust system is disclosed. The apparatus includes a heating section for providing a thermal chamber, thereby transforming incoming gas and oxygen into solid substance. A barrier section is secured to an inner surface of the heating section for preventing the solid substance from accumulating on the inner surface of the heating section. A scrubbing section attached to the heating section is used to expel the solid substance out of the gas exhaust apparatus.

Growing community of inventors

Tainan, Taiwan

Ka-Hing Wong