Steag Rtp Systems Gmbh

Hq-dielectrics Gmbh

Centrotherm Photovoltaics Ag

Centrotherm International Ag

Jürgen Niess

Wilfried Lerch

Alexander Gschwandtner

Patrick Schmid

Uwe Kreiser

Karsten Weber

Wilhelm Kegel

Hartmut Rick

Olgun Altug

Michael Grandy

Wilhelm Beckmann

An apparatus and a method for determining the temperature of a substrate, in particular of a semiconductor substrate during the heating thereof by means of at least one first radiation source are disclosed. A determination of the temperature is based on detecting first and second radiations, each comprising radiation emitted by the substrate due to its own temperature and radiation emitted by the first radiation, which is reflected at the substrate and at least one of a drive power of the first radiation source and the radiation intensity of the first radiation source.

Device for determining the temperature of a substrate

The aim of the invention is to reduce the formation of scratches in a device for the thermal treatment of substrates, in particular, semiconductor substrates, in a chamber in which the substrate is placed upon support elements. According to the invention, said aim is achieved by means of displaceable support elements.

Device for thermal treatment of substrates

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Sontheim, Germany

Jürgen Niess