Singulus Technologies Ag

Jürgen Langer

Berthold Ocker

Wolfram Maass

Roland Schneider

Uwe Mühlfeld

Christoph Mundorf

Dietmer Schneider

Helmut John

Rudi Spielvogel

Eric Claussen

Wolfgang Stern

Helmut Lausmann

Matthias Landmann

Reinhard Sommerfeld

Dietmar Schneider

The invention relates to a target for coating a substrate with an alloy by means of cathode sputtering, said alloy having at least one first material and one second material as alloy components. The surface of the target has at least one first section made of the first material and one second section made of the second material. The two sections adjoin each other and form a common boundary line. The invention further relates to a device and a method for coating a substrate with an alloy by means of cathode sputtering using the target according to the invention.

Coating substrates with an alloy by means of cathode sputtering

The invention relates to a sputtering cathode () for coating a substrate (), which comprises a device () for generating an external magnetic field with substantially parallel magnetic field lines () substantially in the plane of the substrate. The invention further relates to a device and a method for coating a substrate with several layers, whereby several sputtering cathodes are disposed in a circle with their target effective areas pointing radially outward.

Sputtering cathode and device and method for coating a substrate with several layers

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Offenbach, Germany

Jürgen Langer