Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Jürgen Fischer

Hubert Holderer

Ulrich Weber

Alexander Kohl

Johannes Lippert

Florian Bach

Wolfgang Hummel

Jochen Weber

Thorsten Rassel

Karl-Eugen Aubele

Erich Merz

Klaus Rief

Raoul Reiner

Markus Neumaier

Michael Mühlbeyer

Bärbel Trossbach

Thomas Rohe

Stefan Schöngart

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure machine

Growing community of inventors

Heidenheim, Germany

Jürgen Fischer