Ivoclar Vivadent Ag

Jörg Zimmermann

Volker Rheinberger

Ulrich Salz

Norbert Moszner

Frank Zeuner

Simone Klapdohr

Jorg Angermann

Angela Mucke

Urs Karl Fischer

Iris Lamparth

Rolf Mülhaupt

Jörg Tiller

Rolf Mühlhaupt

Dirk Poppe

Christian Waschinski

Volker M Rheinberger

A filler which is surface-modified with a compound of the formula [(PG)-R&#x2014;Z]&#x2014;SP&#x2014;[Y&#x2014;R-(AG)]is particularly suitable for use in dental materials, for the preparation of adhesives, coatings and composites.

Surface-modified fillers

Dental composition containing (i) at least one acid (meth)acrylamide monomer which has two or more polymerizable groups, (ii) at least one acid monomer which has only one polymerizable group and (iii) at least one polymerization initiator.

Hydrolysis-stable self-etching single-component dental adhesive

Polymerizable dental material, characterized in that it contains at least one (meth)acrylamide phosphate of the following general formula (I): in which Ris H or CH; Ris H or a C-Calkyl radical or forms together with the nitrogen atom to which it is bonded and one or more atoms which belong to Ror Ra heterocyclic ring; R, Rindependently of each other are a linear or branched aliphatic C-Cradical with a valency of m+n or p+n, an aromatic C-Cradical with a valency of m+n or p+n, or a cycloaliphatic, araliphatic or heterocyclic C-Cradical with a valency of m+n or p+n, wherein the carbon chains of the radical or radicals can be interrupted by O, S, CONR, OCONH, or form together with one or more atoms which belong to Rand the nitrogen atom, to which the Ris bonded a heterocyclic ring, R' being H if p=0, and Rbeing H, C-Calkyl, C-Caryl, C-aralkyl or a bicylic C-Cradial; n is 1, 2, 3 or 4 if p=0, and is 1 or 2 if p &#x2260;0; m is 1, 2, 3 or 4; p is 0, 1, 2, 3 or 4; x is 0 or S.

Self-etching dental materials based on (METH) acrylamide phosphates

Dental material which contains at least one compound of the formula [PG]&#x2014;R&#x2014;Z&#x2014;SP&#x2014;Y&#x2014;R&#x2014;[WG], in which m=1, 2 or 3; p=1, 2 or 3; R=is absent, a linear or branched Cto Calkylene radical which can be interrupted one or more times by O, S, NH, SiR', CONH CONR&#x2032;, COO and/or OCONH, a substituted or unsubstituted, aromatic Cto Cradical or a combination thereof R=is absent, a linear or branched Cto Calkylene radical which can be interrupted one or more times by O, S, NH, SiR&#x2032;, CONH CONR&#x2032;, COO and/or OCONH, a substituted or unsubstituted, aromatic Cto Cradical or a combination thereof; PG=a radically polymerizable group; SP=a polymeric spacer which is selected from polyethylene glycol, polypropylene glycol, polyglycerol, polyalkyloxazoline, polyethyleneimine, polyacrylic acid, polymethacrylic acid, polyvinyl alcohol, polyvinyl acetate, poly-(2-hydroxyethyl)acrylate, poly-(2-hydroxyethyl)methacrylate groups, hydrophilic polypeptide groups and copolymers of the corresponding monomers; WG=antimicrobially active group; Z=is absent, O, S, an ester, amide or urethane group; Y=is absent, O, S, an ester, amide or urethane group, and which has a molecular weight of at least 1,000.

Dental materials based on radically polymerizable macromers with antimicrobial effect

Polymerizable materials which contain (1) 1 to 80 wt.-% of at least one polysiloxane, (2) 0.1 to 5 wt.-% of one or more initiators for radical polymerization, (3) 0 to 60 wt.-% of radically polymerizable monomer and (4) 1 to 50 wt.-% of one or more radically polymerizable monomers which carry at least phosphonic acid group, sulphonic acid group and/or mono- or dihydrogen phosphoric acid ester group, the polysiloxane (1), the monomer (3) or both being substituted by fluorine. The materials are suitable in particular for the coating of natural or artificial teeth.

Dental coating materials

Acrylic ester phosphonic acids of general formula (I), stereoisomers thereof and mixtures of these,wherein n is 1 or 2, on the condition that for n=1 Rhas the meaningand for n=2 Rhas the meaningRis a Cto Calkylene radical, C-Ccycloalkylene radical or Cto Calkylene phenylene radical; Ris hydrogen, a Cto Calkyl radical or a Cto CO-alkyl radical; and R, R, independently of each other, each stand for a Cto Calkyl radical or a Cto CO-alkyl radical.

Growing community of inventors

Lustenau, Austria

Jörg Zimmermann