Valtion Teknillinen Tutkimuskeskus

Teknologian Tutkimuskeskus Vtt Oy

Teknologian Tutkimuskeskus Vtt

Jyrki Kiihamäki

Tuomas Pensala

Antti Jaakkola

Hannu Kattelus

Mika Prunnila

Ari Hokkanen

Feng Gao

Päivi Heimala

Maria Ganchenkova

The invention concerns a micromechanical device and method of manufacturing thereof. The device comprises an oscillating or deflecting element made of semiconductor material comprising n-type doping agent and excitation or sensing means functionally connected to said oscillating or deflecting element. According to the invention, the oscillating or deflecting element is essentially homogeneously doped with said n-type doping agent. The invention allows for designing a variety of practical resonators having a low temperature drift.

Micromechanical devices comprising n-type doping agents

The application relates to microfluidic needles and their manufacturing methods. The microfluidic needle comprises an interface portion containing at least one fluid communication channel, an elongated needle portion () projecting away from the interface portion (), the needle portion having a tip and sidewalls connecting the tip to the interface portion, and at least two microfluidic channels (A-B) within the needle portion in fluidic connection with the at least one communication channel, the microfluidic channels being at least partly oriented parallel to the elongated needle portion. According to the application, the microfluidic channels exit the needle portion at the sidewalls of the needle portion. The needle may be fabricated by ALD-assisted silicon micromachining. The needle can be used for injection and/or sampling fluids to/from tissue or individual cells.

Microneedle

The invention relates to a microelectromechanical resonators and a method of manufacturing thereof. The resonator comprises at least two resonator elements made from semiconductor material, the resonator elements being arranged laterally with respect to each other as an array, at least one transducer element coupled to said resonator elements and capable of exciting a resonance mode to the resonator elements. According to the invention, said at least one transducer element is a piezoelectric transducer element arranged laterally with respect to the at least two resonator elements between the at least two resonator elements and adapted to excite to the resonator elements as said resonance mode a resonance mode whose resonance frequency is dependent essentially only on the celastic parameter of the elastic modulus of the material of the resonator elements. By means of the invention, electrostatic actuation and problems associated therewith can be avoided and accurate resonators can be manufactured.

Micromechanical resonator array and method for manufacturing thereof

The present invention relates to a method for manufacturing an acceleration sensor. In the method, thin SOI-wafer structures are used, in which grooves are etched, the walls of which are oxidized. A thick layer of electrode material, covering all other material, is grown on top of the structures, after which the surface is ground and polished chemo-mechanically, thin release holes are etched in the structure, structural patterns are formed, and finally etching using a hydrofluoric acid solution is performed to release the structures intended to move and to open a capacitive gap.

Method for manufacturing micromechanical components

The present publication discloses a method for forming cavities in prefabricated silicon wafers comprising a first silicon layer (), a second monocrystalline silicon layer, or a so-called structural layer (), oriented substantially parallel with said first silicon layer () and an insulating layer () situated between said first and second layers (). According to the method, in at least one of the conducting silicon layers () are fabricated windows () extending through the thickness of the layer, and cavities are etched in the insulating layer () by means of etchants passed to the layer via said fabricated windows (). According to the invention, subsequent to the fabrication step of the windows () and prior to the etching step, a thin porous layer () is formed on the surface to be processed such that the etchants can be passed through said porous layer into said cavities () being etched and, after the cavities () are etched ready, at least one supplementary layer () is deposited in order to render to the material of said porous layer impermeable to gases.

Growing community of inventors

Helsinki, Finland

Jyrki Kiihamäki