Asml Netherlands B.v.

Justin Johannes Hermanus Gerritzen

Thibault Simon Mathieu Laurent

Niek Jacobus Johannes Roset

Marco Adrianus Peter Van Den Heuvel

Martijn Houben

Ruud Hendrikus Martinus Johannes Bloks

Siegfried Alexander Tromp

Yuri Johannes Gabriël Van De Vijver

Coen Hubertus Matheus Baltis

Giovanna De Simone

Thomas Poiesz

Marcus Martinus Petrus Adrianus Vermeulen

Abraham Alexander Soethoudt

Gijs Kramer

Simon Karel Ravensbergen

Nicholas Peter Waterson

Vincentius Fransiscus Cloosterman

Martinus Hendrikus Antonius Leenders

Andre Bernardus Jeunink

Mircea Dusa

Frank Johannes Jacobus Van Boxtel

Youssef Karel Maria De Vos

Jeroen Gerard Gosen

Anthonie Kuijper

Bert Dirk Scholten

Jean-Philippe Xavier Van Damme

Antonie Hendrik Verweij

André Schreuder

Arjan Hubrecht Josef Anna Martens

Ringo Petrus Cornelis Van Dorst

Paul Van Dongen

Evelyn Wallis Pacitti

Arie Cornelis Scheiberlich

Niek Elout De Kruijf

Jelmer Mattheüs Kamminga

Peter Schoenmakers

Franciscus Joannes Anthonius Evers

Jaap Wilhelmus Petrus Van Empel

Léon Hubert Joseph Coumans

Gerhard Albert Ten Brinke

Robby Franciscus Josephus Martens

Dirk Jerome Andre Senden

Johannes Gerardus Maria Mulder

A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

Method of unloading an object from a support table

A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Lithographic apparatus, method for unloading a substrate and method for loading a substrate

An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

Extraction body for lithographic apparatus

A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method

A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.

Lithographic apparatus and device manufacturing method

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Veldhoven, Netherlands

Justin Johannes Hermanus Gerritzen