Leybold Optics Gmbh

Jurgen Pistner

Michael Scherer

Harro Hagedorn

Gerd Deppisch

Walter Lehnert

Mario Roder

Michael Klosch-Trageser

A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Method for producing a multilayer coating and device for carrying out said method

The invention relates to an apparatus () for producing a reflection-reducing layer on a surface () of a plastics substrate (). The apparatus comprises a first sputtering device () for applying a base layer () to the surface () of the plastics substrate (), a plasma source () for plasma-etching the coated substrate surface (), and a second sputtering device () for applying a protective layer () to the substrate surface (). These processing devices () are arranged jointly in a vacuum chamber (), which has inlets () for processing gases. In order to move the substrate () between the processing devices () in the interior of the vacuum chamber (), a conveying apparatus () is provided which is preferably in the form of a rotary table (). Furthermore, the invention relates to a method for producing such a reflection-reducing layer on the surface () of the plastics substrate ().

Method and apparatus for producing a reflection-reducing layer on a substrate

A plasma source generates a plasma beam that is extracted from a plasma generated by electric and magnetic fields. An RF electrode device includes an excitation electrode having an excitation area, and a plasma space is arranged between extraction electrode and excitation area. The plasma, relative to the extraction electrode is at a higher potential which accelerates positive plasma ions, and the plasma and the extracted plasma beam are influenced by a magnetic field. At least one magnet north pole and one magnetic south pole generate the magnetic field. Each are arranged such that a curved magnetic field projecting into the interior of the plasma space is formed. At least one of the north or south poles is embodied in elongate fashion to form a tunnel-like region in the plasma, in which charged particles are held and along which the latter can propagate.

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Alzenau-Michelbach, Germany

Jurgen Pistner