Leybold Aktiengesellschaft

Commonwealth Scientific

Jurgen Engemann

A grid assembly for ion beam sources includes grid structures that are etched from a semiconductor wafer using microelectronic fabrication techniques with the grid structures constrained in an aligned manner by a ceramic carrier having embedded electrically conductive pads for effecting electrical contact with the grid structures. The grid structures are fabricated by creating oxide and photoresist layers on a starting silicon wafer and exposing the photoresist through a mask carrying the aperture pattern. After the photoresist is developed, the oxide layer is etched to form openings therethrough and the silicon wafer is anisotropically etched from both sides with the etching proceeding anisotropically so that the {111} planes are etched to form the apertures in which the {111} planes face each other across the aperture with opposite {111} planes at a 90.degree. angle relative to one another to provide a plurality of apertures each defining a volume in the form of an inverted truncated 4-sided pyramid. The ceramic carrier is assembled as a preform from a flexible Al.sub.2 O.sub.3 /polymer dielectric tape and is initially fabricated by cutting the various laminae L.sub.1, L.sub.2, L.sub.n-1, . . . L.sub.n into the desired configuration and assembling the laminae in a stacked configuration for burnout and firing to form a unitary ceramic carrier. The etchant formed grids are cemented into place in the carrier with an electrically conductive high-temperature cement.

Grid assembly for ion beam sources and method therefor

The invention relates to a device for the generation of electrically charged and/or uncharged particles in which into a cavity resonator (5) filled with a gas or gas mixture electromagnetic energy is introduced and in which a first magnetic field (19, 20) permeates the gas or gas mixture. With the aid of a second magnetic field (H.sub.ext, 40, 41) permeating the gyromagnetic material the cavity resonator (5) is tuned. Usually, the tuning is carried out in such a manner that a hollow space resonator (5) which is loaded and mistuned by the plasma is again brought into resonance.

Device for the generation of electrically charged and/or uncharged

Process for producing extraction grids for ion sources. A mounting plate (1) of a thermostable material is provided on both sides with a continuous metal coating (2, 3). An essentially congruent pattern of holes is produced in the mounting plate (1) and in the metal coatings (2, 3). In such an extraction system, the metal coatings, electrically separated on either side, form extraction grids or electrodes. By disposing a core region (1a) of a conducting or semiconducting material in the mounting plate (1), a third electrode can be produced for controlling the ion beam.

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Wuppertal, Germany

Jurgen Engemann