Tokyo Electron Limited

Junsuke Hoshiya

Naoki Mihara

Naoki Matsumoto

Jun Yoshikawa

Masayuki Kohno

Yusuke Yoshida

Michitaka Aita

Yoshikazu Azumaya

Ippei Shimizu

Naoto Hayasaka

Kouko Yumura

A mounting state informing apparatus includes a database, an acquisition unit, a first specifying unit, a comparison unit and an output unit. The database stores information upon a mounting position and a direction of each of multiple components belonging to a processing apparatus. The acquisition unit acquires first appearance data, which is obtained by a 3D scanner, indicating a state of an appearance of the processing apparatus. The first specifying unit identifies the multiple components based on the first appearance data and specifies a mounting position and a direction of each of the identified components. The comparison unit compares the specified mounting position and the specified direction of each of the identified components with the information upon the mounting position and the direction stored in the database. The output unit is configured to output a comparison result obtained by the comparison unit.

Mounting state informing apparatus and mounting state informing method

A plasma processing apparatus includes a processing chamber, a table disposed in the processing chamber, a dielectric window provided at the processing chamber, and a surrounding body made of a dielectric material surrounding a processing space between the table and the dielectric window. The dielectric window and the surrounding body are separated from each other in a vertical direction with a predetermined gap therebetween.

Plasma processing apparatus

Growing community of inventors

Miyagi, Japan

Junsuke Hoshiya