Nanjing University of Aeronautics and Astronautics

Sws Hemodialysis Care Co., Ltd.

Junquan Zhou

Chao Meng

Peihuang Lou

Xiaoming Qian

Kai Meng

Xing Wu

Hangying Zhang

Guikang Ye

Guangyong Gao

Yuan Liu

Jin Tong

Mingzhong Lai

The embodiments of the present disclosure provide a method for an image simulation generation based on a near-field simulation of a computational electromagnetic field, the method comprising: constructing a simulated three-dimensional model based on model parameters; constructing a simulated Kohler illumination model based on a light source parameter; using a degree of similarity change in a synthesized image under incremental aperture diaphragm sampling points as a criterion for approximate convergence of the simulation to determine a count of samples to be used for a balancing combination of simulation cost and accuracy; an optical simulation is performed based on the simulated three-dimensional model and the simulated Kohler illumination model, and a far-field electromagnetic field distribution data is obtained to obtain a simulated image by synthesizing the image. In the generation of a large count of simulated images on the basis of pseudo-random defect dataset generation may be further realized, in the acquisition of a large count of datasets, the dataset of defect inspection model may be trained, in order to achieve a direct detection for patterned wafer defective images and solve the problem of difficult access to reference images in a process of patterned wafer defect detection.

Methods for image simulation, pseudo-random defect dataset generation, and micro and nano defects detection

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Nanjing, China

Junquan Zhou