China Petroleum Chemical Corporation

China Petroleum & Chemical Corporation Qingdao Research Institute of Safety Engineering

Junpeng Ren

Shanjun Mu

Lin Wang

Shucai Zhang

Feng Sun

Wei Xu

Jing Zhang

Tie Zhang

Guosheng Dong

Ning Shi

Described are a low temperature plasma reaction device and a hydrogen sulfide decomposition method. The reaction device includes: a first cavity; a second cavity, the second cavity being embedded inside or outside the first cavity; an inner electrode, the inner electrode being arranged in the first cavity; an outer electrode; and a barrier dielectric arranged between the outer electrode and the inner electrode. The hydrogen sulfide decomposition method includes: implementing dielectric barrier discharge at the outer electrode and the inner electrode of the low temperature plasma reaction device, introducing a raw material gas containing hydrogen sulfide into the first cavity to implement a hydrogen sulfide decomposition method, and continuously introducing a thermally conductive medium into the second cavity in order to control the temperature of the first cavity of the low temperature plasma reaction device.

Low temperature plasma reaction device and hydrogen sulfide decomposition method

Growing community of inventors

Qingdao, China

Junpeng Ren