Schott Ag

Schott Glass Technologies (suzhou) Co. Ltd.

Junming Xue

Bernd Hoppe

Bianca Schreder

Lothar Niessner

Martin Feichtinger

Sean Qian

Carsten Renz

Marten Walther

Jose Zimmer

Pengxiang Qian

Huiyan Fan

Rainer Liebald

Feng He

Matthias Jotz

Ning Da

Gottfried Haas

Chong Wang

Markus Riedl

Folker Steden

Yunfei Hou

Hiroshi Kuroki

Fritz Wintersteller

Wenliang Ping

Csaba Debreczeny

Fredrik Prince

Thomas Wedlich

Takahisa Uchida

A chemically toughenable or toughened glass has, before chemical toughening, a thickness t of at most 1100 μm. The glass comprises the following components: 45-75 mol-% SiO; 10-25 mol-% AlO; >1-11 mol-% LiO; 0-15 mol-% PO; 0-8 mol-% BO; and 0-5 mol-% TiO. The average number of bridging oxygen per polyhedron (BO) calculated as 2*4−2*(c(O)/(c(Si)+c(Al)+c(B)+c(P)+c(Ti))) is higher than 3.55. Upon chemical toughening, the linear dimension variation in the unit of percentage (V) is so low that the overall geometry variation (OGV) calculated as (DoL/t)/Vis higher than 0.8. DoL is the total depth of all ion-exchange layers on one side of the glass and DoL is more than 1 μm, when the glass is chemically toughened with NaNOonly, KNOonly or with both KNOand NaNO.

Lithium containing aluminosilicate glass with low expansion after chemical toughening

The present disclosure relates to glass articles, a method of making the glass articles, and uses of the glass articles. The glass article has a UV-transmittance of more than 90% at 350 nm and at 500 nm and a total amount of Si, BOand AlOof at least 75 mol %. The article is preferably used in the fields of biotechnology, MEMS, CIS, MEMS-like pressure sensor, display, micro array, electronic devices, microfluidics, semiconductor, high precision equipment, camera imaging, display technologies, sensor/semicon, electronic devices, home appliance, diagnostic product, and/or medical device.

Bondable glass and low auto-fluorescence article and method of making it

A low CTE boro-aluminosilicate glass having a low brittleness for use in wafer-level-packaging (WLP) applications is disclosed. The glass comprises a composition in mol-% of SiO: 60-85, AlO: 1-17, BO: 8-20, NaO: 0-5, KO: 0-5, MgO: 0-10, CaO: 0-10, SrO: 0-10, and BaO: 0-10. An average number of non-bridging oxygen per polyhedron (NBO) is equal to or larger than &#x2212;0.2 and a ratio BO/AlOis equal to or larger than 0.5. The NBO is defined as NBO=2&#xd7;O/(Si+Al+B)&#x2212;4. A glass carrier wafer made from the low CTE boro-aluminosilicate glass and a use thereof as a glass carrier wafer for the processing of a silicon substrate are also disclosed, as well as a method for providing a low CTE boro-aluminosilicate glass.

Low CTE boro-aluminosilicate glass for glass carrier wafers

The present invention is directed to a kind of machinable glass ceramic which can be chemically toughened. The machinable and chemically toughenable glass ceramic, which comprises, as represented by weight percentage based on the following compositions, 25-75 wt % of SiO, 6-30 wt % of AlO, 0.1-30 wt % of NaO, 0-15 wt % of KO, 0-30 wt % of BO, 4-35 wt % of MgO, 0-4 wt % of CaO, 1-20 wt % of F, 0-10 wt % of ZrO, 0.1-10 wt % of PO, 0-1 wt % of CeOand 0-1 wt % of SnO, wherein PO+NaO&#x3e;3 wt %, and AlO+NaO+PO&#x3e;17 wt %. Mica crystalline phase can be formed in the glass ceramic and the glass ceramic can be chemically toughened by one step, two steps or multiple steps with depth of K-ion layer of at least 15 &#x3bc;m and surface compress stress of at least 300 MPa. The profile on depth of the ion exchange layer follows the complementary error function. Hardness can be improved by at least 20% after chemical toughening. The dimension deviation ratio is less than 0.06% by ion-exchanging.

Machinable and chemically toughenable fluorine glass-ceramic

A method for production of a photo-structurable glass element is provided. The method includes the steps of: fixing a blank of photo-structurable glass at a first end; heating of a deformation zone of the blank; and drawing the blank. The glass includes Si, a crystal-agonist, a crystal-antagonist, and a pair of nucleating agents. The crystal-agonist is selected from the group consisting of Na, K, Li, and any combinations thereof. The crystal-antagonist is selected from the group consisting of Al, B, Zn, Sr, Sb, and any combinations thereof. The pair of nucleating agents include cerium and an agent selected from the group consisting of silver, gold, copper, and any combinations thereof. The crystal-agonist has a molar proportion cat.-% in relation to a molar proportion of Sithat is at least 0.3 and at most 0.85.

Method for producing photo-structurable glass bodies by a redrawing method

A sensitized, photo-structurable glasses and methods for producing are provided. The glasses includes Si, one or more crystal-agonist, one or more crystal-antagonist, and one or more pair of nucleating agents. The glasses are sensitized in that the glass reacts more sensitive to irradiation with UV-light and can be crystallized easier and with higher aspect ratios than a non-sensitized glass with equal composition. Furthermore, the sensitized glasses of this invention have smaller crystal sizes after irradiation and tempering than a non-sensitized glass with equal composition. The invention also relates to a structured glass product. Such product can be obtained by submitting the crystallized glass product to a subsequent etching step. The structured product can be used in components or as component for the application fields micro-technology, micro-reaction-technology, electronic packaging, micro-fluidics, FED spacer, bio-technology, interposer, and/or three-dimensional structured antennae.

Sensitized, photo-sensitive glass and its production

A method for continuous production of photo-sensitive glass bodies, glass bodies, and structured glass articles are provided. The glass bodies include a glass having Si, at least one crystal-agonist, at least one crystal-antagonist, and at least one pair of nucleating agents. The glass may be used in a method for structuring of glass. The glass bodies may be structured and/or unstructured and used in different applications such as in components or as components in micro-technology, in micro-reaction-technology, in electronic packaging, for micro-fluidic components, in or as FED spacer, for bio-technology (for example titer plates), as interposer, and in or as three-dimensional structurable antennae.

Continuous production of photo-sensitive glass bodies

Growing community of inventors

Shanghai, China

Junming Xue