Sumitomo Chemical Company, Limited

Junji Shigematsu

Takayuki Miyagawa

Ichiki Takemoto

Nobuo Ando

Tatsuro Masuyama

Kazuhiko Hashimoto

Yusuke Fuji

Satoshi Yamamoto

Isao Yoshida

Masahiko Shimada

Akira Kamabuchi

Yukako Harada

Masumi Suetsugu

Kunishige Edamatsu

Hanwoo Park

A Photoresist composition comprising a polymer comprising a structural unit derived from a compound represented by the formula (I): wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents a C6-C12 aromatic hydrocarbon group which can have one or more substituents, Rrepresents a cyano group or a C1-C12 hydrocarbon group which can have one or more substituents and which can contain one or more heteroatoms, Arepresents a single bond, &#x2014;(CH)&#x2014;CO&#x2014;O&#x2014;* or &#x2014;(CH)&#x2014;O&#x2014;CO&#x2014;(CH)&#x2014;CO&#x2014;O&#x2014;* wherein g, h and i each independently represent an integer of &#x2212;1 to 6 and * represents a binding position to the nitrogen atom, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.

Photoresist composition

The present invention provides a chemically amplified resist composition comprising: wherein Rrepresents a hydrogen atom or a methyl group, ring Xrepresents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having &#x2014;COO&#x2014; and k represents an integer of 1 to 4, wherein Rrepresents a hydrogen atom, a methyl group or a trifluoromethyl group, and

Chemically amplified positive resist composition

The present invention provides a sulfonium compound represented by the formula (I): wherein Qand Qeach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 represents a C5-C42 organic group having a &#x3b2;-ketoester structure and Arepresents an organic counter ion, and a chemically amplified photoresist composition comprising the above-mentioned sulfonium compound and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

Sulfonium compound

The present invention provides a chemically amplified resist composition comprising:

The present invention provides a chemically amplified positive composition comprising: wherein Rrepresents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or &#x2014;(CH)&#x2014;CO&#x2014;X&#x2014;, k represents an integer of 1 to 4, X, X, Xand Xeach independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, and

The present invention provides a salt represented by the formula (I): wherein

Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

The present invention provides a polyhydric phenol compound represented by the formula (I): wherein at least one selected from R, R, R, R, and Ris a group represented by the formula (II): 

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Ibaraki, Japan

Junji Shigematsu