Mitsubishi Electric Corporation

Kao Corporation

Junji Kondo

Kenji Inomata

Nobuyuki Takahashi

Yoshitsugu Sawa

Seiji Muranaka

Itaru Kanno

Hiroyuki Tsutada

Takahide Hirai

Mami Shirota

Megumi Irie

Yasunori Horio

A detection apparatus improves abnormality detection accuracy after start of an inspection operation while reducing the amount of work that is done before the start of the operation. The apparatus includes an object characteristic storage device that stores a parameter indicating a characteristic of an abnormal object, an object detection unit that detects an abnormal object candidate from image information by using the parameter, an object storage unit that stores the abnormal object candidate, an object display unit that displays the abnormal object candidate stored in the object storage unit, a calibration input unit that receives input of calibration information on the abnormal object candidate, and, based on the calibration information, corrects the abnormal object candidate stored in the object storage unit, and an object characteristic calibration unit that calibrates the parameter stored in the object characteristic storage device, based on the calibration information received by the calibration input unit.

Detection apparatus and detection method

An access-level control apparatus includes an NC machine tool, an RFID that is held by an operator and stores an ID given to the operator, a reader unit that reads out the ID, an authenticating unit that determines operator processing limitation information including an operable range by the operator associated with the ID or display information provided to the operator, an operation/display limiting unit that limits processing by the operator for the NC machine tool on the basis of the operator processing limitation information, and a separation detecting unit that periodically reads out, after the authentication, the ID in the RFID, performs re-authentication, and detects presence or absence of separation of the operator. When detecting as a result of the re-authentication that the operator separates from the NC machine tool, the separation detecting unit releases the authentication.

Access-level control apparatus

An access-level control apparatus includes an NC machine tool, an RFID that is held by an operator and stores an ID given to the operator, a reader unit that reads out the ID in the RFID, an authenticating unit that determines operator processing limitation information including an operable range by the operator associated with the ID or display information provided to the operator, and an operation/display limiting unit that limits processing by the operator for the NC machine tool on the basis of the operator processing limitation information. The reader unit includes a transmission antenna that calls the RFID. The transmission antenna is disposed in parallel to a rotation axis of a motor unit of the NC machine tool.

A position detection sensor using electromagnetic wave () estimates the position of a monitor object () in a first detection region (), and outputs it as a first possibility distribution. A second sensor () estimates the position of the monitor object () in a second detection region (), and outputs it as a second possibility distribution. A distribution computing means () outputs an integrated possibility distribution which it obtains by integrating the possibility distributions of the position of the monitor objectwhich are acquired by these sensors. An information presenting means () outputs the integrated possibility distribution as information about the most possible position of the monitor object ().

Monitoring apparatus

The present invention relates to a detergent composition containing (a) 2 to 30% by weight of an inorganic alkali, (b) 0.5 to 20% by weight of at least one surfactant selected from an anionic surfactant and a nonionic surfactant, (c) 0.01 to 2% by weight (based on calcium ion) of a calcium salt, (d) 0.1 to 15% by weight of a calcium ion-sequestering agent, (e) 1 to 30% by weight of a water-soluble organic solvent and (f) 20 to 95% by weight of water.

Detergent composition comprising calcium gluconate and a mixture of calcium ion sequestering agents

Resist residues, which is formed in a process of forming Al interconnections, are removed through use of a single chemical. A chemical which contains an organic acid or a salt thereof and water and which has a pH below 8 is used as a treatment for removing resist or resist residues. The chemical may be used in a process in which Al, W, Ti, TiN, and SiO are exposed on the surface of a wafer after etching of an Al interconnection; in a process in which Al, W, Ti, TiN, and SiO are exposed on the surface of a wafer after etching a hole reaching an Al interconnection in an dielectric layer; in a process in which Cu is exposed on the surface of a semiconductor wafer after dry-etching of a Cu interconnection or etching of an interlayer dielectric film laid on a Cu interconnection; and in a process in which metal material such as W, WN, Ti, or TiN; poly-Si; SiN; and SiO are exposed on the surface of a wafer after etching of a metal gate.

Growing community of inventors

Tokyo, Japan

Junji Kondo