Hitachi, Ltd.

Japan Science and Technology Agency

Research Development Corporation of Japan

Other

Hamamatsu-photonics K.k.

Junji Endo

Akira Tonomura

Nobuyuki Osakabe

Masahiro Tomita

Takeshi Kawasaki

Shigeto Isakozawa

Yutaka Kaneko

Ken Harada

Tsuneyuki Urakami

Susumu Ozasa

Hiroshi Tsuchiya

Tsuyoshi Matsuda

Shinji Ohsuka

Shuji Hasegawa

Chikara Kimura

Qing X Ru

Jun Chen

Tetsuji Kodama

Toshimitu Miyada

Tadao Furutsu

In an interference measuring device, which includes: a coherent beam generating source; a sample to be measured; a lens system for forming an image of the sample to be measured on an observing plane; an interference element for splitting a coherent beam into two systems, and forming an interference image on the observing plane or a plane equivalent thereto; an image pickup element for picking up the interference image on the observing plane; and a calculating device having functions of capturing and storing the interference image converted to electric signals by the image pickup element, and determining the phase distribution changed by the sample to be measured from the interference image by calculation, wherein a means for removing the phase change distribution due to the interference element is provided.

Interference measuring device

To prevent the displacement from an optical axis of a charged particle beam from being made independent of the direction (parallel to or perpendicular to the optical axis) of a magnetic field applied to a specimen, a system including an electron microscope and using a charged particle beam optical system is provided with a source of a charged particle beam, a condenser optical system, a specimen to be observed, a system for applying a magnetic field to the specimen, an imaging optical system and an image observation/recording apparatus, is provided with first and second charged particle beam deflection systems in order along a direction in which the charged particle beam travels between the condenser optical system and the specimen, is provided with third and fourth charged particle beam deflection systems in order between the specimen and the imaging lens system, and the quantity and the direction of the deflection of the charged particle beam by each deflection system and the intensity and the bearing of a magnetic field applied to the specimen are related according to predetermined relation.

Specimen observation system for applying external magnetic field

An electron-microscope image viewing apparatus capable of measuring of a moving speed or a vibration frequency of an atomic structure, a magnetic structure, an electric structure or the like of a specimen even when the structure changes at a high rate. The apparatus includes a charged particle source for emitting charged particles, an illuminating electron lens system for illuminating a specimen with a beam of the charged particles, an image magnifying/projecting lens system for magnifying an image of the specimen formed by charged particles scattered upon transmission through the specimen and projecting the magnified image onto an image forming plane, at least one charged particle extracting means provided on the image forming plane of the image magnifying/projecting lens system for taking out the charged particles from a predetermined portion of the charged particle beam projected onto the image forming plane, at least one charged particle detector for detecting the charged particles taken out through the charged particle extracting means, and a signal processing means for processing a signal outputted from the charged particle detector.

Charged particle guide apparatus and image viewing apparatus for charged

An interference device and method for observing phase information, using electron or other waves with the amplitude difficult to split by a half mirror. Using an interference device comprising in combination two scattering films A1 and A2 capable of scattering incident waves randomly, first lens systems B1 and B2 that are located between said two scattering films to form the image of one scattering film A1 on the other scattering film A2, a second lens system B3 for forming on an observation surface C the image of a specimen 2 located at a position where a component going straight through said one scattering film is converged in a spot form through said first lens system or a part thereof, and means for recording an interference pattern formed on the observation surface C, an interference pattern is detected while the specimen 2 is inserted in the arrangement, and an interference pattern is detected while the specimen 2 is removed from the arrangement, so that the difference between both the interference patterns, or the sum or product of them, can be found to observe the phase information of the specimen directly as interference fringes.

Interference device and method for observing phase informalities

In an electron holography apparatus having an electron source, a specimen holder, an electron lens system, and an electron biprism, the electron biprism is so constructed as to be rotatable about the electron optics axis. The rotation angle about the electron optics axis is commanded by the operator of the electron holography apparatus. A central wire of the electron biprism is allowed to be translated in a direction orthogonal to the electron optics axis, thus permitting the application of the fringe scanning method. The center of an aperture is selectively allowed to be aligned with that of the electron biprism to ensure that the measurement apparatus can be used selectively as either the electron holography apparatus or an electron microscope.

Electron optical measurement apparatus

A charged particle beam generating apparatus of multi-stage acceleration type includes a charged particle beam source and a multi-stage acceleration tube having a plurality of acceleration electrodes arranged in cascade over a plurality of stages within the tube. A plurality of outer shield electrodes are disposed in concentrical relation on the radially outer side of the multi-stage acceleration tube over the plural stages to be applied with the same potentials as those of the associated acceleration electrodes respectively. Finally, a plurality of dividing resistors are disposed outside of the multi-stage acceleration tube or between the outer shield electrodes and the multi-stage acceleration tube so as to apply predetermined potentials to the acceleration electrodes, respectively.

Charged particle beam generating apparatus of multi-stage acceleration

In a field emission electron gun system with a multi-stage acceleration tube comprising a field emission electron source, a field emission electrode for extracting the electrons, a magnetic lens having a magnetic gap between the field emission electron source and the field emission electrode or a magnetic lens having a magnetic pole which also serves as the field emission electrode, and at least two-stages of acceleration electrodes for accelerating the electrons, a magnetization current I for the magnetic lens is changed interlocking with a field emission voltage V.sub.1 applied between the field emission electron source and the field emission electrode so that IN/.sqroot.V.sub.1 (N: the number of windings of the magnetic lens) takes a predetermined value and a first acceleration voltage V.sub.2 applied between the field emission electron source and the first-stage acceleration electrode is changed interlocking with the field emission voltage V.sub.1 so that V.sub.2 /V.sub.1 takes a predetermined value.

Field emission electron gun system

An electron holography apparatus includes an electron microscope which is provided with an electron source, a beam splitter for dividing an electron beam emitted from the electron source into first and second electron beams, and a phase controller for controllably changing a phase difference between the first and second electron beams, and further includes an image detector for detecting an electron interference fringe pattern which varies in accordance with the phase difference between the first and second electron beams, as a picture image, and an image data processor for determining the phase distribution of one of the first and second electron beams from detected image data.

Electron holography apparatus

A field emission type electron microscope using a multi-stage acceleration tube wherein an acceleration voltage to be applied to at least one, always inclusive of a first-stage acceleration electrode, of acceleration electrodes is changed in interlocked relationship with a change in a field emission voltage to be applied to a field emission electrode, so that power of an electrostatic lens can be kept constant.

Growing community of inventors

Sakado, Japan

Junji Endo