Samsung Electronics Co., Ltd.

Inha-Industry Partnership Institute

Junil Kim

Hyunwoo Kim

Chawon Koh

Tsunehiro Nishi

Jinkyun Lee

Hyuntaek Oh

Jihoon Woo

Seungsoo Choi

A method of manufacturing a semiconductor device, the method including forming a photoresist material layer on a lower film, the photoresist material layer including a crosslinking molecule having a molecular weight of about 1,000 to about 4,000; exposing a partial region of the photoresist material layer; removing an unexposed portion of the photoresist material layer to form a photoresist pattern; and processing the lower film using the photoresist pattern, wherein the crosslinking molecule includes a perfluoro alkyl moiety, the perfluoro alkyl moiety including a carbon-fluorine bond that dissociates in response to the exposing of the partial region of the photoresist material layer.

Method of manufacturing semiconductor device

Growing community of inventors

Suncheon-si, South Korea

Junil Kim