Asahi Glass Company, Limited

Junichiro Kase

Manabu Nishizawa

Yasumasa Nakao

Yuya Shimada

Kazuhiro Suzuki

Hideo Takahashi

Kei Maeda

Akira Takada

Jeetendra Sehgal

Seturo Ito

Akio Koike

Thomas Lambricht

Seiki Ohara

Yuichi Suzuki

Shusaku Akiba

Seiji Miyazaki

Junko Miyasaka

Syuji Matsumoto

Atsuyoshi Takenaka

Terutaka Maehara

Ryoji Akiyama

Kazutomo Mori

Yoshitaka Saijo

Shuji Yamazaki

Tomoyuki Shimizu

A glass sheet for pigment printing contains, as represented by mass percentage on the basis of oxides, from 60% to 75% of SiO, from 2% to 12% of AlO, from 2% to 11% of MgO, from 0% to 10% of CaO, from 0% to 3% of SrO, from 0% to 3% of BaO, from 10% to 18% of NaO, from 0% to 8% of KO, and from 0% to 4% of ZrO, or contains, from 60% to 75% of SiO, from 1.5% to 12% of AlO, from 6% to 12% of MgO, from 0% to 4.5% of CaO, from 0% to 3% of SrO, from 0% to 3% of BaO, from 10% to 18% of NaO, from 0% to 8% of KO, and from 0% to 4% of ZrO.

Glass sheet for pigment printing, pigment-printed glass sheet, production method therefor, and image display device

An object of the present invention is to provide a glass for chemical strengthening which is capable of improving strength as compared with an ordinary soda lime silicate glass even when the same chemical strengthening treatment as that in a conventional process is applied and has good devitrification characteristics, a chemically strengthened glass using the glass for chemical strengthening, and a method for producing the chemically strengthened glass. The present invention provides a glass for chemical strengthening having a specific glass composition described in the present specification.

Glass for chemical strengthening, chemically strengthened glass, and method for manufacturing chemically strengthened glass

A glass for chemical strengthening is a glass sheet containing, as expressed by mass percentage based on oxides, 60 to 75% of SiO, 3 to 12% of AlO, 2 to 10% of MgO, 0 to 10% of CaO, 0 to 3% of SrO, 0 to 3% of BaO, 10 to 18% of NaO, 0 to 8% of KO, 0 to 3% of ZrO, 0 to 0.3% of TiO, 0.005 to 0.2% of FeO, and 0.02 to 0.4% of SO. The glass has a sheet thickness of 0.2 mm or more and 1.2 mm or less. A value of &#x3b2;-OH measured without polishing both front and back surfaces of the glass sheet is lower than a value of &#x3b2;-OH measured after polishing surface layers of both the front and back surfaces of the glass sheet by 50 &#x3bc;m or more each.

Glass for chemical strengthening, chemically strengthened glass, and method for producing chemically strengthened glass

To provide a glass plate which has a low BOcontent and which can be used as a glass plate for e.g. an LCD panel. A glass plate which comprises, as a glass matrix composition as represented by mass % based on oxide, from 53 to 74 mass % of SiO, from 15 to 23 mass % of AlO, from 0 to 3 mass % of BO, from 2 to 17 mass % of MgO, from 0 to 12 mass % of CaO, from 0 to 6 mass % of SrO, from 6 to 28 mass % of MgO+CaO+SrO, from 0 to 9 mass % of NaO, from 0 to 6 mass % of KO and from 0.8 to 11 mass % of NaO+KO, contains from 100 to 500 ppm of SO, has an average coefficient of thermal expansion from 50 to 350&#xb0; C. of at most 60&#xd7;10/&#xb0; C., and has a strain point of at least 600&#xb0; C.

Glass plate, process for producing it, and process for producing TFT panel

The invention provides a method for etching which is intended for reducing the thickness of a glass substrate, and which attains a high etching rate and is capable of inhibiting haze generation on the glass substrate surface. The invention relates to a method for etching a glass substrate surface, comprising etching the glass substrate surface in an amount of 1-690 &#x3bc;m in terms of etching amount, in which the etching is conducted with an etchant having an HF concentration of 1-5 wt % and an HCl concentration of 1 wt % or higher.

Method for etching glass substrate

Provided is a glass plate for a substrate, which comprises, as a glass matrix composition as represented by mass % based on oxide: SiO: 70 to 80, AlO: 0.1 to 5, BO: 0 to 3, MgO: 9.5 to 12, where the amount of CaO+SrO+BaO is 0 to 2, and the amount of NaO+KO is 12.5 to 15.5, which has a density of at most 2.5 g/cm, has an average coefficient of thermal expansion from 50 to 350&#xb0; C. of more than 75&#xd7;10/&#xb0; C. and at most 87&#xd7;10/&#xb0; C., has a glass transition point of at least 560&#xb0; C., has a brittleness of at most 6.5 &#x3bc;m, and has a heat shrinkage (C)of at most 20 ppm.

Glass plate for substrate

To provide a liquid crystal display panel which can be produced at low cost by using inexpensive alkali glass for at least an opposing glass substrate, which is free from troubles in a liquid crystal display due to panel warpage attributable to the thermal treatment since such treatment is not required in the production process, and further which is free from panel warpage which tends to bring a trouble in a liquid crystal display derived from the difference in the thermal expansion coefficient by change in ambient temperature at the time of use. A liquid crystal display panel comprising an array glass substrate and an opposing glass substrate facing it, in which a liquid crystal is filled between such substrates, and an ultraviolet curable resin is sealed at a peripheral area,

Liquid crystal display panel comprising an array glass substrate and an opposing glass substrate with a liquid crystal filler

A glass plate for a substrate, which contains no BO, and which can be as a glass plate for an LCD panel, which comprises, as a glass matrix composition as represented by mass % based on oxide of SiO: 68 to 80, AlO: 0.1 to 5, MgO: 9.5 to 12, CaO+SrO+BaO: 0 to 2, and NaO+KO 6 to 14, and which has a density of at most 2.45 g/cm, an average coefficient of thermal expansion from 50 to 350&#xb0; C. of at most 75&#xd7;10/&#xb0; C., a glass transition point of at least 600&#xb0; C. and a brittleness of at most 6.5 &#x3bc;m.

To provide an alkali-free glass excellent in the properties for glass substrates to be used for display, excellent in the resistance to reduction, and suitable for forming by a float process. An alkali-free glass consisting essentially of, as represented by mol %: and containing substantially no alkali metal oxide.

Alkali-free glass and liquid crystal display panel

To provide an alkali-free glass substrate, which has a high Young's modulus, a low linear expansion coefficient, a high strain point and a low density, does not devitrify in the float forming process and is excellent in acid resistance. An alkali-free glass substrate, which contains neither alkali component nor BaO and consists essentially of, as represented by mol % based on oxide, from 57.0 to 65.0% of SiO, from 10.0 to 12.0% of AlO, from 6.0 to 9.0% of BO, from 5.0 to 10.0% of MgO, from 5.0 to 10.0% of CaO and from 2.5 to 5.5% of SrO, provided that MgO+CaO+SrO is from 16.0 to 19.0%, MgO/(MgO+CaO+SrO)&#x2267;0.40, and BO/(SiO+AlO+BO)&#x2266;0.12; wherein Young's modulus &#x2267;75 GPa; the linear expansion coefficient at from 50 to 350&#xb0; C. is from 30&#xd7;10/&#xb0; C. to 40&#xd7;10/&#xb0; C.; the strain point &#x2267;640&#xb0; C.; the temperature T(the viscosity &#x3b7; satisfies log &#x3b7;=2)&#x2266;1,620&#xb0; C.; the temperature T(the viscosity &#x3b7; satisfies log &#x3b7;=4)&#x2266;1,245&#xb0; C.; the devitrification temperature &#x2266;T; and weight loss per unit area is at most 0.6 mg/cm, when immersed in 0.1N HCl at 90&#xb0; C. for 20 hours.

Alkali-free glass substrate, method for producing it and liquid crystal display panel

To provide an alkali free glass which is suitable as a glass substrate for LCD and has few defects of bubbles and an undissolved starting material, and a process for producing an alkali free glass which can readily lower the defects in bubbles and an undissolved starting material. An alkali free glass with a matrix composition comprising SiO, AlO, BO, MgO, CaO, SrO and BaO and containing substantially no alkali metal oxide, of which the temperature at which the viscosity becomes 10dPa&#xb7;s, is at most 1,600&#xb0; C. and which contains sulfur in an amount of from 0.001 to 0.1% as calculated as SO, as represented by the mass percentage, per 100% of the total amount of the above matrix composition, and a process for producing a glass which comprises preparing a starting material and melting it so that a sulfate be incorporated to the starting material in an amount of from 0.01 to 5% as calculated as SO, as represented by the mass percentage, per 100% of the total amount of the above matrix composition.

Alkali free glass and process for its production

An alkali-free glass consisting essentially of:

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Tokyo, Japan

Junichiro Kase