Sony Corporation

Sony Semiconductor Solutions Corporation

Sony Group Corporation

Junichiro Fujimagari

Jun Ogi

Susumu Inoue

Atsushi Fujiwara

Toshifumi Wakano

Shunsuke Maruyama

Kentaro Akiyama

Tomohiro Ohkubo

Masashi Nakata

Koji Kikuchi

Satoru Wakiyama

Keita Ishikawa

Yoshinori Toumiya

Takuya Nakamura

Junichi Furukawa

Motonobu Torii

Haruhiko Ajisawa

Yukio Tagawa

Hironori Hoshi

Torii Motonobu

Hoshi Hironori

Kikuchi Koji

Naotsugu Yoshida

Yasuhiro Nakana

An imaging device according to an embodiment of the present disclosure includes: a semiconductor layer having one surface serving as a light incident surface and another surface opposed to the one surface, and having a light reception region and a peripheral region in the one surface, the light reception region in which a plurality of photoelectric converters that performs photoelectric conversion on incident light is arranged, and the peripheral region provided around the light reception region; a through via that penetrates between the one surface and the other surface; a first coupling section that is provided on the peripheral region on the one surface side, and has a width wider than the through via; a second coupling section that is provided on the peripheral region on the one surface side, and is used for coupling to an external substrate; a first semiconductor element including a coupling wiring line that electrically couples the first coupling section, the second coupling section, and the through via to one another; and a second semiconductor element that is mounted on the first semiconductor element by the first coupling section.

Imaging device and electronic apparatus

To provide a solid-state imaging device capable of further improving quality. Provided is a solid-state imaging device including: a first semiconductor element having a first semiconductor layer provided with a first through via and a photoelectric conversion unit configured to photoelectrically convert light that has been incident, a connection part that is wider than the first through via and is provided outside a region where the photoelectric conversion unit is provided on a surface of the first semiconductor layer on a side for receiving the light, connection wiring provided on the surface and configured to connect the first through via and the connection part, and a first passivation layer formed on the surface side; a second semiconductor element mounted on the first semiconductor element by the connection part; and a first guard ring formed on an outer peripheral portion of the first semiconductor element to surround the first semiconductor element. In the solid-state imaging device, at least a part of the first guard ring is arranged outside the first semiconductor layer and above a second semiconductor layer formed in substantially the same layer as the first semiconductor layer, and the first guard ring is arranged outside the first passivation layer and below a second passivation layer formed in substantially the same layer as the first passivation layer.

Solid-state imaging device and electronic device

There is provided a semiconductor device including: a plurality of bumps on a first semiconductor substrate; and a lens material in a region other than the plurality of bumps on the first semiconductor substrate, wherein a distance between a side of a bump closest to the lens material and a side of the lens material closest to the bump is greater than twice a diameter of the bump closest to the lens material, and wherein the distance between the side of the bump closest to the lens material and the side of the lens material closest to the bump is greater a minimum pitch of the bumps.

Semiconductor device and manufacturing method, and electronic appliance

The present technology relates to a solid-state image pickup element, electronic equipment, and a semiconductor apparatus that make it possible to reduce a surface reflection in an area in which a slit is formed and improve flare characteristics. A solid-state image pickup element includes a pixel area in which a plurality of pixels is two-dimensionally arranged in a matrix, a chip mounting area in which a chip is flip-chip mounted, and a dam area that is arranged around the chip mounting area and in which one or more slits that block an outflow of a resin are formed. In the dam area, the same OCL as that in the pixel area is formed. The present technology can be applied to a solid-state image pickup element etc. in which a chip is flip-chip mounted, for example.

Solid-state image pickup element, electronic equipment, and semiconductor apparatus

Solid-state image pickup element with dam to control resin outflow

There is provided a semiconductor device including: a plurality of bumps () on a first semiconductor substrate (); and a lens material () in a region other than the plurality of bumps on the first semiconductor substrate, wherein a distance between a side of a bump closest to the lens material and a side of the lens material closest to the bump is greater than twice a diameter of the bump closest to the lens material, and wherein the distance between the side of the bump closest to the lens material and the side of the lens material closest to the bump is greater a minimum pitch of the bumps.

The present technology relates to a solid-state imaging device, an imaging apparatus, an electronic apparatus, and a semiconductor device, which can prevent overflow of an underfilling resin filled in a portion adapted to connect the substrate to the flip chip and can prevent secondary damages such as electric short-circuit and contact with processing equipment. By utilizing a molding technology of forming an on-chip lens, a dam is formed in a ring shape or a square shape in a manner surrounding a range where a flip chip is connected via a solder bump on an upper layer of a substrate of the solid-state imaging device and provided in order to form the on-chip lens. This can block the underfilling resin filled in the range where the substrate and the flip chip are electrically connected. The present technology can be applied to a solid-state imaging device.

Solid-state imaging device, imaging apparatus, electronic apparatus, and semiconductor device

A solid-state image pickup device includes pixels diagonally arranged, each including a photoelectric conversion unit and a plurality of transistors and wiring extending in the vertical and horizontal directions which is diagonally arranged around the photoelectric conversion unit in each of the pixels so that at least one portion of the wiring is arranged along at least one side of the photoelectric conversion unit.

Solid-state image pickup device

A solid-state imaging device includes a semiconductor substrate having a pixel region including a photoelectric conversion portion, a wiring portion including a conductor line and disposed on the semiconductor substrate with an insulating film therebetween, a metal pad connected to the conductor line, a pad-coating insulating film coating the metal pad, and a waveguide material layer. The wiring portion and the pad-coating insulating film each have an opening therein over the photoelectric conversion portion, and the openings continue from each other to define a waveguide opening having an open side and a closed side. The waveguide material layer is disposed in the waveguide opening and on the pad-coating insulating film with a passivation layer therebetween. The pad-coating insulating film has a thickness of 50 to 250 nm and a face defining the opening. The face is slanted so as to diverge toward the open side of the opening.

Solid-state imaging device, method for manufacturing the same and imaging apparatus

Growing community of inventors

Kanagawa, Japan

Junichiro Fujimagari