Canon Kabushiki Kaisha

Tdk Corporation

Yorozu Corporation

Junichi Seki

Nobuhito Suehira

Atsunori Terasaki

Shingo Okushima

Hideki Ina

Masao Majima

Susumu Yasuda

Takao Kusaka

Nobuki Yoshimatsu

Kazuyuki Kasumi

Motoki Okinaka

Tohru Den

Takeaki Itsuji

Koichi Sentoku

Eigo Kawakami

Shunichi Shido

Tosiya Asano

Ichiro Tanaka

Yuichiro Oguchi

Yasuhiro Shimada

Hiroshi Kimura

Ryo Kuroda

Toshiki Ito

Eiji Sakamoto

Yasuhisa Inao

Haruhito Ono

Takako Yamaguchi

Masaharu Matsumoto

Nao Nakatsuji

Tomo Tsuchida

Yukihiro Azuma

The present invention provides a simulation method of predicting a behavior of a curable composition in a process of bringing a plurality of droplets of the curable composition arranged on a first member into contact with a second member and forming a film of the curable composition in a space between the first member and the second member, wherein for each of the plurality of droplets of the curable composition, a distance from a representative point of the droplet to a point on a contour of the droplet is obtained so as to match the area of the inner region of the contour to an area of the droplet obtained from a volume of the droplet and a distance between the first member and the second member in accordance with a change of the distance between the first member and the second member.

Simulation method, simulation apparatus, storage medium, film forming method, and method of producing cured product

There is provided a simulation method of predicting a behavior of a curable composition in a process of bringing a plurality of droplets of the curable composition arranged on one of a first member and a second member into contact with an other of the first member and the second member and forming a film of the curable composition on the first member. The method includes generating a link by connecting two adjacent representative points of the plurality of droplets, generating a cell as a closed region formed by a plurality of links, and determining, based on the presence/absence of merging of droplets corresponding to each link forming the cell, whether a bubble is formed in the cell.

Simulation method, simulation apparatus, and storage medium

A method in which alignment control of a member and a substrate is effected with respect to an in-plane direction of the substrate and an uncured material in a state of bringing a member and the uncured material on a substrate into contact with each other is cured. The method includes a step of bringing the member and the substrate near to each other while effecting the alignment control, based on a driving profile, after the alignment control is started, to bring the member and the uncured material into contact with each other, and then the uncured material is cured, and a step of increasing a gap between the member and the substrate, after the uncured material is cured, wherein the driving profile for the alignment control after the alignment control is started and at least one of before and after the member contacts the uncured material is changed.

Method in which alignment control of a member and a substrate is effected with respect to an in-plane direction of the substrate and an uncured material in a state of bringing a member and the uncured material on a substrate into contact

An imprint apparatus for forming a pattern of an imprint material on a mold and a substrate includes a substrate holding unit configured to hold the substrate, and a charging unit configured to charge at least one of a surface of the substrate holding unit on a side facing the mold or a particle existing in the vicinity of the surface to the same polarity as the charge polarity of the mold.

Imprint apparatus, imprinting method, and method for manufacturing article

An imprint apparatus forms a pattern of an imprint material on a substrate by using a mold, while effecting alignment control of a mold and a substrate with respect to an in-plane direction of the substrate. A mold holding portion holds the mold. A substrate holding portion holds the substrate. A control portion effects control so that the mold and the substrate are brought near to each other while effecting the alignment control, based on a driving profile, after the alignment control is started, to bring the mold and the imprint material into contact with each other. The imprint material is then cured. The control portion changes the driving profile for the alignment control after the alignment control is started and at least one of before and after the mold contacts the imprint material.

Imprinting apparatus for producing a member in which a mold contacts a pattern forming layer using alignment control in an in-plane direction of a substrate

Provided is an imprint method that molds an uncured resin applied to a substrate by a pattern portion formed on a mold and cures the uncured resin so as to form the pattern of the resin cured on the substrate. The imprint method includes a step of releasing the pattern portion from the resin such that two opposed boundaries are brought closer to each other to progress peeling while maintaining a parallel state after curing of the resin based on the assumption that the boundary at which the pattern portion is peeled from the resin is linear.

Imprint method, imprint apparatus, mold, and article manufacturing method

Method of manufacturing a vehicular arm component having a particular torsional rigidity and a sufficient tensile strength. Method of manufacturing a vehicular arm componenthaving a hollow shape in open cross-section by subjecting workpiece W, which is a flat plate, extending in an XY plane to pressing in stages such that two side surfaces W, Wof the workpiece in an XZ plane formed by the X direction and a Z direction face one another across a gap G, the method including a restriking process in which a protrusiondisposed on a restriking dieto be extended in the X direction is arranged in the gap between the two side surfaces facing one another and the two side surfaces are brought into contact with the protrusion such that the workpiece is pressed from an outer periphery to an inner periphery.

Vehicular arm component manufacturing method and vehicular arm component

The present invention provides an imprint apparatus which performs an imprint process of forming, by using a mold, a pattern of an imprint material on a substrate, including an obtaining unit configured to obtain electric charge information on an amount of first electric charges charged on a first surface of the mold on a side of the substrate by releasing the mold from the cured imprint material on the substrate, a supply unit configured to supply second electric charges having a polarity opposite to that of the first electric charges to an electrode arranged on a second surface of the mold on a side opposite to the first surface, and a control unit configured to control, based on the electric charge information, an amount of the second electric charges supplied from the supply unit to the electrode.

Imprint apparatus, mold, imprint method, and method of manufacturing article

An imprint apparatus performs alignment control of a mold and a substrate. A pattern formed on the mold is transferred onto a pattern forming layer on the substrate. A mold holding portion holds the mold, a substrate holding portion holds the substrate, and a control portion effects control so that the mold and the substrate are brought near to each other during the alignment control. The mold and the pattern forming layer are brought into contact with each other and then the pattern forming layer is cured. The control portion changes a driving profile for the alignment control after the alignment control is started and at least one of before and after the mold contacts the pattern forming layer. The driving profile used to move at least one of the mold holding portion and the substrate holding portion to a target position, and includes at least one of acceleration, speed, driving voltage, and driving current.

Imprint apparatus in which alignment control of a mold and a substrate is effected

An imprinting method in which alignment control of a mold and a substrate is effected and a pattern formed on the mold is transferred onto a pattern forming layer provided on the substrate. The imprinting method includes a step in which the mold and the substrate are brought near to each other while effecting the alignment control, after the alignment control is started, to bring the mold and the pattern forming layer into contact with each other, and then, the pattern forming layer is cured, and a step in which the gap between the mold and the substrate is increased, after the pattern forming layer is cured. Further, the alignment control is stopped after the alignment control is started, and at least one of before and after the mold contacts the pattern forming layer.

Imprinting method and process for producing a member in which a mold contacts a pattern forming layer

An imprint method for imprinting an imprint pattern of a mold onto a pattern formation material on a substrate so as to realize a high throughput includes the steps of bringing the imprint pattern and the pattern formation material into contact with each other; applying a first pressure between the mold and the substrate to increase a contact area between the imprint pattern and the pattern formation material; and adjusting a positional relationship between the mold and the substrate at a second pressure lower than the first pressure.

Imprint method, imprint apparatus, and process for producing chip

A light transmissive mold used for imprinting a pattern onto a material applied on a semiconductor workpiece. The mold includes a first surface having an area of a pattern to be imprinted onto the material, a second surface located opposite from the first surface, and a third surface disposed between the first surface and the second surface, at a position inwardly away from the first surface. The third surface is arranged opposite to an area of the workpiece subjected to dicing. An alignment structure, provided for alignment between the mold and the workpiece, is formed in the third surface.

Light transmissive mold and apparatus for imprinting a pattern onto a material applied on a semiconductor workpiece and related methods

There is provided an imprinting apparatus that transfers a pattern of a mold to a resin on a substrate, the imprinting apparatus including a deposition mechanism configured to deposit the resin onto the substrate; a first driving mechanism configured to change a relative position, on a plane parallel to the surface of the substrate, of the substrate and the mold; a second driving mechanism configured to change the relative position, on a plane parallel to the surface of the substrate, of the substrate and the deposition mechanism; and a control unit configured to control the deposition mechanism and the driving mechanism so as to perform a resin deposition process of depositing the resin onto the substrate and an imprint process of transferring the pattern of the mold to the resin on the substrate in parallel.

Imprinting apparatus and method therefor

A process of producing a member having a pattern. The process includes preparing a first mold having a pattern surface provided with a first uneven pattern at a surface of the first mold, and preparing a second mold having a pattern surface, provided with a second uneven pattern at a surface of the second mold, including a shape portion corresponding to an outer peripheral shape of the pattern surface provided with the first uneven pattern. When the pattern is transferred onto the member in a transfer area including (i) a peripheral area, which is an area not large enough to transfer an entire first uneven pattern of the first mold, and (ii) an area inside the peripheral area, in the area inside the peripheral area, the first uneven pattern of the first mold is transferred plural times to form a pattern group of the first uneven patterns, and in the peripheral area, the second uneven pattern of the second mold, including a shape portion corresponding to an outer peripheral shape of the pattern group, is transferred.

Process for producing member having pattern, pattern transfer apparatus, and mold

An imprint apparatus for performing alignment between a mold and a substrate and imprinting a pattern of the mold to a layer of the substrate. A holder holds the mold. A stage holds the substrate opposite to the mold held by the holder. A microscope, including an image pickup device, detects a first alignment mark formed in the mold, via a first image pickup area of the image pickup device, and detects a second alignment mark formed in the substrate, via a second image pickup area of the image pickup device. The first and second image pickup areas do not overlap with each other. A contrast of signals obtained by the image pickup device is adjusted with respect to each of the first and second image pickup areas, and the alignment is performed by changing relative positions of the holder and the stage based on first information about a deviation of the detected first alignment mark from a predetermined position in the first image pickup area and second information about a deviation of the detected second alignment mark from a predetermined position in the second image pickup area.

Growing community of inventors

Yokohama, Japan

Junichi Seki