Canon Kabushiki Kaisha

Junichi Motojima

Mitsuhide Nishimura

Koji Yoshida

Shinichiro Hirai

Tsutomu Terao

Masatoshi Endo

Yoshihiro Omameuda

Naoto Ohkawa

A control apparatus for performing position control of a moving object is provided. The apparatus includes a feedforward controller configured to perform feedforward control by giving a feedforward manipulated variable to the moving object. In a case that a duration of the feedforward control exceeds a predetermined time, the feedforward controller continues the feedforward control using a feedforward manipulated variable obtained based on a feedforward manipulated variable used in a predetermined section including an end of the predetermined time.

Control apparatus, lithography apparatus, and article manufacturing method

A control device for performing position control of a control target by imparting a feedforward operation amount to the control target to curb a control deviation even when a continuous target time of the control exceeds an upper limit in a case where the position control is performed by imparting the feedforward operation amount, including at least one processor or circuit configured to function as a determination unit configured to determine whether or not a target time for continuing the control using the feedforward operation amount exceeds a predetermined time, and a correction unit configured to correct the feedforward operation amount to be damped toward an end of the target time in a case where it is determined by the determination unit that the target time has exceeded the predetermined time.

Control device, control method, lithographic apparatus, method of manufacturing article, and storage medium

An exposure apparatus that exposes a substrate is provided. The apparatus includes a stage configured to hold and move the substrate, and a controller configured to control focus driving of the stage based on a measurement value and a correction value obtained for the focus driving of the stage for a shot region on the substrate. The controller is configured to determine the correction value in accordance with an angle of view at a time of exposure.

Exposure apparatus, method thereof, and method of manufacturing article

The present invention provides a control device that performs position control of a control target by giving a feedforward manipulated value to the control target, wherein the device obtains, for each of a plurality of positions at which the control target is to be arranged, a measurement result of a first output response of the control target obtained when giving a first manipulated value to the control target, determines a reference value of the first output response, based on the measurement results respectively obtained at the plurality of positions, determines a second manipulated value by arraying a plurality of first manipulated values in time-series based on a relationship between the first manipulated value and the reference value, and sets the feedforward manipulated value based on the second manipulated value.

Control device, lithography apparatus, and method of manufacturing article

The present invention provides an exposure apparatus which exposes a substrate, comprising a measurement unit configured to measure a height of the substrate at each of a plurality of measurement points, and a control unit configured to control the height of the substrate based on measurement results obtained by the measurement unit, and control an operation to arrange a shot region of the substrate in a first position and expose the shot region, wherein the shot region includes a plurality of partial regions, and the control unit causes the measurement unit to measure the height of the substrate by arranging the shot region in a second position different from the first position so that the number of measurement points arranged in the plurality of partial regions is larger than that when arranging the shot region in the first position.

Exposure apparatus, exposure method, and method of manufacturing article

An apparatus includes a stage configured to hold a substrate and to be moved, a measurement station including a measurement device configured to measure, with respect to each of a plurality of measurement points in a surface of the substrate held by the stage, a position of the surface, and an exposure station configured to expose the substrate to radiation while the stage is scanned, the stage being moved to the exposure station from the measurement station after the position of the surface is measured, and being scanned in the exposure station in accordance with the measured position of the surface, wherein the apparatus is configured to calculate a status concerning an error of a measurement value of the measurement device with respect to each of the plurality of measurement points based on outputs of the measurement device obtained with respect to the plurality of measurement points, and to set arrangement of the plurality of measurement points based on the calculated statuses.

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Utsunomiya, Japan

Junichi Motojima