Tokyo Ohka Kogyo Co., Ltd.

Junichi Miyakawa

Masatoshi Arai

Takashi Nagamine

Takuya Ikeda

Koshi Onishi

A resist composition that generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, which contains a resin component (A1) exhibiting changed solubility in a developing solution under action of acid, the resin component (A1) has a constitutional unit (a01) derived from a compound represented by General Formula (a0-1), Wrepresents a polymerizable group-containing group, Yarepresents a single bond or a divalent linking group, Rarepresents a cyclic acid dissociable group, q represents an integer in a range of 0 to 3, and n represents an integer of 1 or more, provided that n&#x2264;q&#xd7;2+4 is satisfied

Resist composition, method of forming resist pattern, compound, and resin

A resist composition that generates an acid upon exposure is soluble in a developing solution, and is changed by action of an acid. The resist composition contains a resin component having solubility in a developing solution, which is changed by action of an acid, and has a constitutional unit represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1). In General Formula (a01-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Yaxrepresents a single bond or a linking group; Ax represents a sulfonyl group or a sulfoxide group; and Raxrepresents an alkyl group, an alkoxy group, a halogen atom, or a halogenated alkyl group. In General Formula (a02-1), W represents a polymerizable group-containing group, Warepresents a cyclic group having an (n+1)-valent aromaticity, which may have a substituent, Wamay form a condensed ring with W, and nrepresents an integer of 1 to 3 

Resist composition and method of forming resist pattern

A resist composition that generates an acid upon exposure and has solubility in a developing solution, which is changed by action of an acid, the resist composition containing a resin component having a constitutional unit represented by General Formula (a01-1) and a constitutional unit represented by General Formula (a02-1). In General Formula (a01-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Yaxrepresents a linking group; Ax represents a sulfonyl group or a sulfoxide group; Raxrepresents an alkyl group, an alkoxy group, a halogen atom, or a halogenated alkyl group; s0 and v0 represent an integer of 0 to 6; and 1&#x2264;s0+v0&#x2264;6 and u0&#x2264;s0+v0. In General Formula (a02-1), Rarepresents an acid-dissociable group represented by General Formula (a02-r2-1) 

A resist composition containing a base material component (A) of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, Rto Reach independently represent an aryl group which may have a substituent, provided that at least two of Rto Rare aryl groups having one or more fluorine atoms as substituents, and at least one of the fluorine atoms of the aryl group is bonded to a carbon atom adjacent to a carbon atom that is bonded to the sulfur atom in the formula, and the total number of the fluorine atoms is 4 or more; Xrepresents a counter anion. 

Resist composition, method of forming resist pattern, and compound

A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, Rto Reach independently represent an aryl group which may have a substituent, provided that one or more of Rto Rare aryl groups having a fluorinated alkyl group which may have a substituent, and at least one of the fluorinated alkyl groups which may have a substituent in these aryl groups is bonded to a carbon atom adjacent to a carbon atom that is bonded to a sulfur atom in the formula, and a total number of the fluorinated alkyl groups which may have a substituent is 2 or more; Xrepresents a counter anion. 

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Junichi Miyakawa