Toto Ltd.

Junichi Iwasawa

Toshihiro Aoshima

Hironori Hatono

Hiroaki Ashizawa

Takuma Wada

Ryoto Takizawa

Yuuki Takahashi

Ryoichi Nishimizu

Atsushi Kinjo

According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.

Plasma-resistant member

A plasma-resistant member that includes a base material and a layer structural component is provided, wherein the layer structural component includes an yttria polycrystalline body, is formed at a surface of the base material, and has plasma resistance; crystallites that are included in the yttria polycrystalline body included in the layer structural component are not bonded to each other via a heterogenous phase; the yttria polycrystalline body included in the layer structural component has a crystal structure including only cubic, or a crystal structure in which cubic and monoclinic coexist; and an average value of a proportion of monoclinic to cubic inside the yttria polycrystalline body included in the layer structural component is greater than 0% and not more than 60%.

Disclosed is provision of a ceramic coat having an excellent low-particle generation as well as a method for assessing the low-particle generation of the ceramic coat. A composite structure including a substrate and a structure which is formed on the substrate and has a surface, wherein the structure includes a polycrystalline ceramic and the composite structure has luminance Sa satisfying a specific value calculated from a TEM image analysis thereof, can be suitably used as an inner member of a semiconductor manufacturing apparatus required to have a low-particle generation.

Composite structure, semiconductor manufacturing apparatus and display manufacturing apparatus provided with composite structure

There is provided a plasma-resistant member, including: a base material; and a layer structural component formed by aerosol deposition at a surface of the base material, the layer structural component being plasma-resistant and including an yttria polycrystalline body, the yttria polycrystalline body included in the layer structural component having a crystal structure in which cubic and monoclinic coexist, a proportion of monoclinic to cubic inside the yttria polycrystalline body included in the layer structural component being not less than 0% and not more than 60%, a crystallite size of the yttria polycrystalline body included in the layer structural component being not less than 8 nm and not more than 50 nm.

A composite structure having excellent plasma resistance includes a base material having a surface containing a ceramic polycrystal and a structure formed on the surface of the base material containing the ceramic polycrystal, wherein the structure contains a polycrystal containing a brittle material; a grain boundary layer having a glass layer does not substantially exist on a boundary face between crystals forming the polycrystal; a part of the polycrystal forms an anchor part embedded into the base material surface; and an average roughness (Ra) of an interface between the anchor part and the base material surface is 100 nm or less.

Composite structure and production method thereof

According to the present invention, a structure made of yttrium oxide is formed on a surface of a substrate comprises yttrium oxide polycrystals as a main component, a boundary layer made of hyaline does not substantially exist on a boundary face between crystals which form the structure, and both a cubic system and a monoclinic system exist in the crystal system of the yttrium oxide polycrystals. With this, it is possible to adjust the hardness of the structure made of yttrium oxide formed on a surface of a substrate to be larger than that of an yttrium oxide sintered body.

Growing community of inventors

Fukuoka-ken, Japan

Junichi Iwasawa