Gigaphoton Inc.

Komatsu Corporation

Kabushiki Kaisha Komatsu Seisakusho

Ushio Denki Kabushiki Kaisha

Other

Junichi Fujimoto

Osamu Wakabayashi

Hakaru Mizoguchi

Kouji Kakizaki

Tsukasa Hori

Takashi Matsunaga

Takayuki Yabu

Shinji Nagai

Hiroaki Tsushima

Takahito Kumazaki

Satoshi Tanaka

Masahiko Kowaka

Natsushi Suzuki

Yoshiho Amada

Tatsuo Enami

Hisakazu Katsuumi

Akihiko Kurosu

Kouji Ashikawa

Jeffrey P Sercel

Yosuke Ishizuka

Toru Suzuki

Takanobu Ishihara

Yutaka Shiraishi

Akira Sumitani

Yasufumi Kawasuji

Teiichirou Chiba

Noritoshi Ito

Hidenobu Kameda

Koichi Kajiyama

Hiroaki Nakarai

Shinji Okazaki

Yasuhiro Nozue

Kaoru Saito

Takahiro Tatsumi

Tomokazu Takahashi

Yasao Itakura

Kazuki Nagai

Rei Takenaka

Masanori Teramoto

Hideo Iwase

A chamber device includes a housing into which a laser gas is filled, a pair of discharge electrodes generating light from the laser gas when a voltage is applied thereto, a window arranged at a wall surface of the housing and transmitting the light therethrough, a first fan causing the laser gas to flow between the discharge electrodes, a filter, a second fan rotating together with the first fan by a drive force of a drive source of the first fan, a fan-side flow path causing the laser gas filtered by the filter to flow by the second fan and a part of the laser gas to flow in a direction away from the window, and a window-side flow path communicating with the fan-side flow path and causing the laser gas flowing from the fan-side flow path by the second fan to flow toward the window.

Chamber device, gas laser device, and electronic device manufacturing method

A chamber device includes an inner housing including a passage port through which light generated by excitation of laser gas at an internal space thereof passes, an outer housing surrounding at least a part of the inner housing from a lateral side of a travel direction of the light, and a partition wall arranged between the inner housing and the outer housing and fixed to the inner housing and the outer housing.

Chamber device, and electronic device manufacturing method

To cool a capacitor including a first electrode and a second electrode, a capacitor cooling structure includes: a conducting part electrically connected with the first electrode; an insulating part that has a first surface including a first position and a second surface including a second position, and is connected with the conducting part at the first position; a first fastening part configured to fasten the conducting part and the insulating part to each other; and a cooling part connected with the second position facing the first position, the conducting part and the cooling part being electrically insulated from each other by the insulating part.

Capacitor cooling structure and laser apparatus

A laser exposure system may include a plurality of laser devices configured to output laser beams with which an irradiated subject is irradiated, and at least one beam property adjustment unit disposed on optical paths of the laser beams outputted from the plurality of laser devices, and configured to allow beam properties of the laser beams to be approximately a same as each other.

Laser system or laser exposure system

A preliminary ionization discharge device used in a laser chamber of a laser apparatus using preliminary ionization includes a dielectric pipe; a preliminary ionization inner electrode provided inside the dielectric pipe; and a preliminary ionization outer electrode provided outside the dielectric pipe. The preliminary ionization outer electrode includes: a contact plate part configured to contact the dielectric pipe; and an elastic part configured to exert a force in a direction in which the contact plate part pushes the dielectric pipe.

Preliminary ionization discharge device and laser apparatus

A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.

Two-beam interference apparatus and two-beam interference exposure system

There is provided a laser chamber housing a pair of discharge electrodes and a gas circulation fun, the laser chamber including: a magnetic bearing configured to support a shaft of the gas circulation fan, with the shaft being in non-contact with the magnetic bearing; and a touchdown bearing configured to operate as a bearing when the magnetic bearing is uncontrollable, the touchdown bearing being provided with solid lubricant configured of one or more of an Au plating layer, a Ni-containing plating layer, and a Cu plating layer.

Laser chamber and discharge excitation gas laser apparatus

A discharge-pumped gas laser device may include a laser chamber, a pair of discharge electrodes provided in the laser chamber, a fan with a magnetic bearing being provided in the laser chamber and configured to be capable of circulating a gas in the laser chamber, a housing configured to contain the laser chamber, and a magnetic bearing controller connected to the magnetic bearing electrically, being capable of controlling the magnetic bearing, and provided in the housing separately from the laser chamber.

Discharge-pumped gas laser device

A master oscillator system may include a grating that functions as one of a plurality of resonator mirrors in an optical resonator, an optical element disposed within an optical path between the plurality of resonator mirrors, and an attitude control mechanism that adjusts an angle at which laser light traveling within the optical resonator is incident on the grating by adjusting the attitude of the optical element.

Master oscillator system and laser apparatus

An extreme ultraviolet light generation apparatus may include a droplet production device configured to produce a droplet of a target substance in a predetermined traveling direction, a first laser device configured to generate a first laser beam and irradiate the droplet with the first laser beam to diffuse the droplet, a second laser device configured to generate a second laser beam and irradiate the target substance diffused by irradiation of the first laser beam with the second laser beam to produce plasma of the diffused target substance and generate extreme ultraviolet light from the plasma of the target substance, and a beam shaping unit configured to elongate a beam spot of the first laser beam in the traveling direction of the droplet produced by the droplet production device.

Extreme ultraviolet light generation by polarized laser beam

A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.

Chamber apparatus and extreme ultraviolet light generation system

A laser apparatus may include: a first module including an oscillator configured to output a laser beam and an oscillator support portion for supporting the oscillator; a second module including a beam delivery unit for delivering the laser beam and a beam delivery unit support portion for supporting the beam delivery unit; a third module including an amplifier for amplifying the laser beam and an amplifier support portion for supporting the amplifier; and a frame on which the modules are placed, the frame including mounts on which the oscillator support portion, the beam delivery support portion and the amplifier support portion are placed.

Laser apparatus

When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.

Chamber replacing method

A holder device for holding an optical element includes a holder having first and second members to sandwich the optical element therebetween, and a sealing member for creating a seal between the second member and the optical element.

Holder device, chamber apparatus, and extreme ultraviolet light generation system

Growing community of inventors

Oyama, Japan

Junichi Fujimoto